In-situ synchrotron X-ray diffraction study of stress-induced phase transformation in Ti50.1Ni40.8Cu9.1 thin films

2012 ◽  
Vol 407 (17) ◽  
pp. 3437-3440 ◽  
Author(s):  
H. Wang ◽  
G.A. Sun ◽  
B. Chen ◽  
Y.Q. Fu ◽  
X.L. Wang ◽  
...  
2015 ◽  
Vol 3 (43) ◽  
pp. 11357-11365 ◽  
Author(s):  
Geert Rampelberg ◽  
Bob De Schutter ◽  
Wouter Devulder ◽  
Koen Martens ◽  
Iuliana Radu ◽  
...  

VO2 and V2O3 thin films were prepared during in situ XRD investigation by oxidation and reduction of V and V2O5. Films show up to 5 orders of magnitude resistance switching.


2005 ◽  
Vol 244 (1-4) ◽  
pp. 281-284 ◽  
Author(s):  
Naohiko Kato ◽  
Ichiro Konomi ◽  
Yoshiki Seno ◽  
Tomoyoshi Motohiro

2013 ◽  
Vol 103 (24) ◽  
pp. 242904 ◽  
Author(s):  
J. Sinsheimer ◽  
S. J. Callori ◽  
B. Ziegler ◽  
B. Bein ◽  
P. V. Chinta ◽  
...  

2013 ◽  
Vol 97 (4) ◽  
pp. 1256-1263 ◽  
Author(s):  
Zlatomir D. Apostolov ◽  
Pankaj Sarin ◽  
Robert W. Hughes ◽  
Waltraud M. Kriven

2014 ◽  
Vol 582 ◽  
pp. 360-363 ◽  
Author(s):  
Olga Ivanova ◽  
Myroslav Karpets ◽  
Alain R. Yavari ◽  
Konstantinos Georgarakis ◽  
Yuriy Podrezov

2011 ◽  
Vol 116 (1) ◽  
pp. 1401-1407 ◽  
Author(s):  
K. Sakaki ◽  
N. Terashita ◽  
S. Tsunokake ◽  
Y. Nakamura ◽  
E. Akiba

2005 ◽  
Vol 176 (25-28) ◽  
pp. 2059-2064 ◽  
Author(s):  
D LISOVYTSKIY ◽  
Z KASZKUR ◽  
J PIELASZEK ◽  
M MARZANTOWICZ ◽  
J DYGAS

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