Study on staged work hardening mechanism of nickel-based single crystal alloy during atomic and close-to-atomic scale cutting

2021 ◽  
Vol 68 ◽  
pp. 35-56
Author(s):  
ZhaoPeng Hao ◽  
ZaiZhen Lou ◽  
YiHang Fan
Keyword(s):  
Single Crystal ◽  
Work Hardening ◽  
Atomic Scale ◽  
Hardening Mechanism ◽  
Single Crystal Alloy

A Fundamental Model of Aluminum Single Crystal Behavior with Physical Description of Kinematic Work Hardening

2007 ◽  
Vol 550 ◽  
pp. 577-582 ◽  
Author(s):  
Afaf Saai ◽  
Laurent Tabourot ◽  
Christophe Déprés ◽  
Herve Louche
Keyword(s):  
Single Crystal ◽  
Work Hardening ◽  
Single Crystal Sample ◽  
Large Strains ◽  
Shear Stresses ◽  
State Variables ◽  
Aluminum Single Crystal ◽  
Crystal Sample ◽  
Hardening Mechanism ◽  
Fundamental Model

In this paper, we present a fundamental model of FCC single crystal behaviour at room temperature: this model includes kinematic work hardening derived from the elementary description of the collective dislocations density evolution during cyclic loading. This kinematic work hardening is then coupled with the isotropic work hardening mechanism. Using this original model, a simulation of a tensile test on a single crystal sample is carried out in the case of an initial crystal orientation that promotes single glide even at rather large strains. The evolution of resolved shear stresses on the primary and secondary slip systems are interpreted by means of the interaction between the evolution of isotropic and kinematic work hardening variables. The evolution of the model state-variables including applied resolved shear strain, dislocation densities, and critical shear stresses are represented as functions of the evolution of crystalline orientation during plastic deformation.

CMSX-2

Alloy Digest ◽  
1992 ◽  
Vol 41 (11) ◽  
Keyword(s):  
Physical Properties ◽  
Single Crystal ◽  
Alloy Development ◽  
Single Crystal Alloy ◽  
High Level

Abstract CMSX-2 is a single crystal alloy development of Cannon-Muskegon Corporation designed to achieve a high level of balanced properties. This datasheet provides information on composition, physical properties, as well ascreep and fatigue. Filing Code: Ni-417. Producer or source: Cannon-Muskegon Corporation.

scholarly journals Redox-driven atomic-scale changes in mixed catalysts: VOX/WOX/α-TiO2 (110)

RSC Advances ◽  
2014 ◽  
Vol 4 (110) ◽  
pp. 64608-64616 ◽  
Author(s):  
Z. Feng ◽  
M. E. McBriarty ◽  
A. U. Mane ◽  
J. Lu ◽  
P. C. Stair ◽  
...  
Keyword(s):  
Single Crystal ◽  
Crystal Surface ◽  
Oxide Catalysts ◽  
Atomic Scale ◽  
Redox Behavior ◽  
Single Crystal Surface ◽  
Tungsten Oxides ◽  
Mixed Monolayer ◽  
X Ray

X-ray study of vanadium–tungsten mixed-monolayer-oxide catalysts grown on the rutile α-TiO2 (110) single crystal surface shows redox behavior not observed for lone supported vanadium or tungsten oxides.

Laser-Induced Ablation and Laser Drilling of DD6 Nickel-Based Single-Crystal Alloy by Nanosecond and Picosecond Lasers

Applied laser ◽  
2014 ◽  
Vol 34 (6) ◽  
pp. 551-556 ◽  
Author(s):  
纪亮 Ji Liang ◽  
张晓兵 Zhang Xiaobing ◽  
张伟 Zhang Wei ◽  
孙瑞峰 Sun Ruifeng ◽  
韩家广 Han Jiaguang
Keyword(s):  
Single Crystal ◽  
Laser Drilling ◽  
Single Crystal Alloy ◽  
Picosecond Lasers

Atomic-Scale Planarization of Single Crystal Diamond Substrates by Ultraviolet Rays Assisted Machining

2010 ◽  
Vol 447-448 ◽  
pp. 66-70 ◽  
Author(s):  
Mutsumi Touge ◽  
Satoru Anan ◽  
Shogo Wada ◽  
Akihisa Kubota ◽  
Yoshitaka Nakanishi ◽  
...  
Keyword(s):  
Electron Diffraction ◽  
Single Crystal ◽  
Low Energy ◽  
Energy Electron ◽  
Atomic Scale ◽  
Polished Surface ◽  
Ultraviolet Rays ◽  
Low Energy Electron Diffraction ◽  
Single Crystal Diamond ◽  
Low Energy Electron

The ultra-precision polishing assisted by the ultraviolet rays irradiation was performed to achieve the atomic-scale planarization of the single crystal diamond substrates. This polishing method is a novel and simple polishing method characterizing by a quartz disk and an ultraviolet irradiation device. The principle three crystal planes of the diamond substrate were polished by this method. The polished surfaces were evaluated by an optical interferometric profilers (Wyko), an atom force microscope (AFM) and LEED (low-energy electron diffraction). The surface roughness of the polished diamond substrates was evaluated as 0.2 ~ 0.4 nmRa in (100), (110) and (111) crystal planes. The LEED (low-energy electron diffraction) patterns indicated the almost perfect crystallographic structure without the residual processed strain beneath the polished surface. In this paper, the optimum polishing condition to achieve the atomic-scale planarization of the diamond substrates has been investigated by the evaluation of LEED patterns, Wyko and AFM images. The mechanismof the ultraviolet rays assisted polishing is discussed in detail.

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