High-aspect nano-groove fabrication in thick film resists using 150-kV high acceleration voltage electron beam lithography

2021 ◽  
Author(s):  
Tatsuki Sugihara ◽  
Satoshi Nagai ◽  
Arata Kaneko
Keyword(s):  
Electron Beam ◽  
Thick Film ◽  
Electron Beam Lithography ◽  
Voltage Electron ◽  
High Acceleration ◽  
Acceleration Voltage

Reduction of long range fogging effect in a high acceleration voltage electron beam mask writing system

1999 ◽  
Vol 17 (6) ◽  
pp. 2936 ◽  
Author(s):  
Munehiro Ogasawara ◽  
Naoharu Shimomura ◽  
Jun Takamatsu ◽  
Shusuke Yoshitake ◽  
Kenji Ooki ◽  
...  
Keyword(s):  
Electron Beam ◽  
Long Range ◽  
Writing System ◽  
Voltage Electron ◽  
High Acceleration ◽  
Fogging Effect ◽  
Acceleration Voltage

3D nanofabrication using controlled-acceleration-voltage electron beam lithography with nanoimprinting technology

2019 ◽  
Vol 8 (3-4) ◽  
pp. 253-266
Author(s):  
Noriyuki Unno ◽  
Jun Taniguchi
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Cost ◽  
Three Dimensional ◽  
Surface Areas ◽  
Voltage Electron ◽  
3D Nanostructures ◽  
Wide Range ◽  
Lift Off ◽  
Acceleration Voltage

Abstract Nanostructures have unique characteristics, such as large specific surface areas, that provide a wide range of engineering applications, such as electronics, optics, biotics, and thermal and fluid dynamics. They can be used to downsize many engineering products; therefore, new nanofabrication techniques are strongly needed to meet this demand. A simple fabrication process with high throughput is necessary for low-cost nanostructures. In recent years, three-dimensional (3D) nanostructures have attracted much attention because they dramatically opened up new fields for applications. However, conventional techniques for fabricating 3D nanostructures contain many complex processes, such as multiple patterning lithography, metal deposition, lift-off, etching, and chemical-mechanical polishing. This paper focuses on controlled-acceleration-voltage electron beam lithography (CAV-EBL), which can fabricate 3D nanostructures in one shot. The applications of 3D nanostructures are introduced, and the conventional 3D patterning technique is compared with CAV-EBL and various 3D patterning techniques using CAV-EBL with nanoimprinting technology. Finally, the outlook for next-generation devices that can be fabricated by CAV-EBL is presented.

An Evaluation of High Acceleration Voltage Electron Beam Writing on X-Ray Masks

1998 ◽  
Vol 37 (Part 1, No. 5A) ◽  
pp. 2445-2450
Author(s):  
Koji Kise ◽  
Sunao Aya ◽  
Hideki Yabe ◽  
Kaeko Kitamura ◽  
Kenji Marumoto
Keyword(s):  
Electron Beam ◽  
X Ray ◽  
Voltage Electron ◽  
High Acceleration ◽  
Acceleration Voltage

Low voltage electron beam lithography in self‐assembled ultrathin films with the scanning tunneling microscope

1994 ◽  
Vol 64 (3) ◽  
pp. 390-392 ◽  
Author(s):  
C. R. K. Marrian ◽  
F. K. Perkins ◽  
S. L. Brandow ◽  
T. S. Koloski ◽  
E. A. Dobisz ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ultrathin Films ◽  
Electron Beam Lithography ◽  
Scanning Tunneling Microscope ◽  
Low Voltage ◽  
Scanning Tunneling ◽  
Tunneling Microscope ◽  
Voltage Electron ◽  
Self Assembled

Fabrication of bio-inspired 3D nanoimprint mold using acceleration-voltage-modulation electron-beam lithography

2019 ◽  
Vol 8 (3-4) ◽  
pp. 289-297 ◽  
Author(s):  
Kohei Goto ◽  
Jun Taniguchi
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Modulation Method ◽  
Imprint Lithography ◽  
3D Structures ◽  
Rose Petal ◽  
Rose Petals ◽  
Acceleration Voltage ◽  
Nano Imprint

Abstract Methods for fabricating micro- and nanoscale three-dimensional (3D) structures such as electron-beam lithography (EBL) attracted attention in various fields. In EBL, an acceleration-voltage modulation method can be used to control the developing depth of the structure. In this study, we fabricated a rose petal structure using acceleration-voltage modulation. Using a rose petal mold, plastic- and silver-duplicated rose petals were prepared using nano-imprint lithography (NIL). We demonstrated that various complex 3D structures and materials can be duplicated using NIL by applying an acceleration-voltage modulation method.

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