Spatial distribution of air kerma rate and impact of accelerating voltage on the quality of an ultra soft X-ray beam generated by a cold cathode tube in air

2015 ◽  
Vol 80 ◽  
pp. 23-28 ◽  
Author(s):  
N. Ounoughi ◽  
C. Mavon ◽  
A. Belafrites ◽  
M. Fromm
2004 ◽  
Vol 15 (3) ◽  
pp. 214-219 ◽  
Author(s):  
Andréa Gonçalves ◽  
João Manuel Domingos de Almeida Rollo ◽  
Marcelo Gonçalves ◽  
Francisco Haiter Neto ◽  
Frab Norberto Bóscolo

This study evaluated the performance of aluminum-copper alloy filtration, without the original aluminum filter, for dental radiography in terms of x-ray energy spectrum, air kerma rate and image quality. Comparisons of various thicknesses of aluminum-copper alloy in three different percentages were made with aluminum filtration. Tests were conducted on an intra-oral dental x-ray machine and were made on mandible phantom and on step-wedge. Depending on the thickness of aluminum-copper alloy filtration, the beam could be hardened and filtrated. The use of the aluminum-copper alloy filter resulted in reductions in air kerma rate from 8.40% to 47.33%, and indicated the same image contrast when compared to aluminum filtration. Aluminum-copper alloy filtration may be considered a good alternative to aluminum filtration.


2019 ◽  
Vol 2019 (23) ◽  
pp. 8824-8828
Author(s):  
Bo Wang ◽  
Jinjie Wu ◽  
Haiyan Du ◽  
Siming Guo ◽  
Shiwei Ren
Keyword(s):  
X Ray ◽  

2006 ◽  
Vol 33 (6Part2) ◽  
pp. 1983-1984
Author(s):  
S Davis ◽  
J Micka ◽  
L DeWerd ◽  
T Rusch

2000 ◽  
Vol 55 (1) ◽  
pp. 49-56 ◽  
Author(s):  
J Geyer ◽  
J Reisel ◽  
J Flock ◽  
J.A.C Broekaert
Keyword(s):  
X Ray ◽  

2021 ◽  
Vol 46 (3) ◽  
pp. 120-126
Author(s):  
Alexandra Schelleman ◽  
Chris Boyd

Background: This paper aims to evaluate the clinical utility and radiation dosimetry, for the mobile X-ray imaging of patients with known or suspected infectious diseases, through the window of an isolation room. The suitability of this technique for imaging coronavirus disease 2019 (COVID-19) patients is of particular focus here, although it is expected to have equal relevance to many infectious respiratory disease outbreaks.Materials and Methods: Two exposure levels were examined, a “typical” mobile exposure of 100 kVp/1.6 mAs and a “high” exposure of 120 kVp/5 mAs. Exposures of an anthropomorphic phantom were made, with and without a glass window present in the beam. The resultant phantom images were provided to experienced radiographers for image quality evaluation, using a Likert scale to rate the anatomical structure visibility.Results and Discussion: The incident air kerma doubled using the high exposure technique, from 29.47 μGy to 67.82 μGy and scattered radiation inside and outside the room increased. Despite an increase in beam energy, high exposure technique images received higher image quality scores than images acquired using lower exposure settings.Conclusion: Increased scattered radiation was very low and can be further mitigated by ensuring surrounding staff are appropriately distanced from both the patient and X-ray tube. Although an increase in incident air kerma was observed, practical advantages in infection control and personal protective equipment conservation were identified. Sites are encouraged to consider the use of this technique where appropriate, following the completion of standard justification practices.


1991 ◽  
Vol 62 (6) ◽  
pp. 1539-1541 ◽  
Author(s):  
P. B. Legrand ◽  
J. P. Dauchot ◽  
M. Hecq
Keyword(s):  
X Ray ◽  

2010 ◽  
Vol 4 (1) ◽  
pp. 1-6 ◽  
Author(s):  
Yoh Katoh ◽  
Sogo Mita ◽  
Masahiro Fukushi ◽  
Yoshiyuki Nyui ◽  
Shinji Abe ◽  
...  
Keyword(s):  
X Ray ◽  

1978 ◽  
Vol 7 (3) ◽  
pp. 138-144 ◽  
Author(s):  
J. C. Mills ◽  
C. B. Belcher
Keyword(s):  
X Ray ◽  

Author(s):  
L. D. Jackel

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.


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