Gravel replenishment and active-channel widening for braided-river restoration: The case of the Upper Drac River (France)

Author(s):  
Guillaume Brousse ◽  
Frédéric Liébault ◽  
Gilles Arnaud-Fassetta ◽  
Bertrand Breilh ◽  
Sandrine Tacon
Water ◽  
2020 ◽  
Vol 12 (2) ◽  
pp. 514 ◽  
Author(s):  
Andrea Mandarino ◽  
Giacomo Pepe ◽  
Michael Maerker ◽  
Andrea Cevasco ◽  
Pierluigi Brandolini

From the 1990s onwards several Italian rivers have experienced a recent phase characterized by active-channel widening and, generally, by bed-level stability or slight aggradation. However, its triggering factors and its diffusion, along with the relationship between active-channel planform dynamics and vertical adjustments, are still quite debated and only few studies are available. This research deals with the active-channel planform changes occurred along the Scrivia River floodplain reach (NW Italy) over the period 1999–2019 and it aims at investigating in detail the ongoing geomorphological processes under the river management perspective. The study is based on a quantitative multitemporal analysis of aerial photographs and satellite images performed in a GIS environment and supported by field surveys. The outcomes revealed a generalized trend of gentle active-channel widening together with widespread bank instability and several (26% of total banks) intense and localized bank retreats involving both the modern floodplain and the recent terrace. In the investigated 20-year period, the active-channel area has increased by 22.7% (from 613.6 to 753.0 ha), its mean width by 25% (from 151.5 to 189.3 m), whereas no relevant length variations have been noticed. These morphological dynamics have been more or less pronounced both at reach scale and over time. The extreme floods occurred in the investigated period can be considered the most important triggering factor of the active-channel planform changes, most probably together with an increase of the reach-scale unit stream power due to changes in the channel geometry occurred over the 20th century.


2020 ◽  
Vol 123 (4) ◽  
pp. 655-668
Author(s):  
N. Lenhardt ◽  
W. Altermann ◽  
F. Humbert ◽  
M. de Kock

Abstract The Palaeoproterozoic Hekpoort Formation of the Pretoria Group is a lava-dominated unit that has a basin-wide extent throughout the Transvaal sub-basin of South Africa. Additional correlative units may be present in the Kanye sub-basin of Botswana. The key characteristic of the formation is its general geochemical uniformity. Volcaniclastic and other sedimentary rocks are relatively rare throughout the succession but may be dominant in some locations. Hekpoort Formation outcrops are sporadic throughout the basin and mostly occur in the form of gentle hills and valleys, mainly encircling Archaean domes and the Palaeoproterozoic Bushveld Complex (BC). The unit is exposed in the western Pretoria Group basin, sitting unconformably either on the Timeball Hill Formation or Boshoek Formation, which is lenticular there, and on top of the Boshoek Formation in the east of the basin. The unit is unconformably overlain by the Dwaalheuwel Formation. The type-locality for the Hekpoort Formation is the Hekpoort farm (504 IQ Hekpoort), ca. 60 km to the west-southwest of Pretoria. However, no stratotype has ever been proposed. A lectostratotype, i.e., the Mooikloof area in Pretoria East, that can be enhanced by two reference stratotypes are proposed herein. The Hekpoort Formation was deposited in a cratonic subaerial setting, forming a large igneous province (LIP) in which short-termed localised ponds and small braided river systems existed. It therefore forms one of the major Palaeoproterozoic magmatic events on the Kaapvaal Craton.


Author(s):  
J.S. McMurray ◽  
C.M. Molella

Abstract Root cause for failure of 90 nm body contacted nFETs was identified using scanning capacitance microscopy (SCM) and scanning spreading resistance microscopy (SSRM). The failure mechanism was identified using both cross sectional imaging and imaging of the active silicon - buried oxide (BOX) interface in plan view. This is the first report of back-side plan view SCM and SSRM data for SOI devices. This unique plan view shows the root cause for the failure is an under doped link up region between the body contacts and the active channel of the device.


2013 ◽  
Author(s):  
John Tucker
Keyword(s):  

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