Single-step deep reactive ion etching of ultra-deep silicon cavities with smooth sidewalls

2014 ◽  
Vol 208 ◽  
pp. 66-72 ◽  
Author(s):  
R.K. Chutani ◽  
M. Hasegawa ◽  
V. Maurice ◽  
N. Passilly ◽  
C. Gorecki
Keyword(s):  
Reactive Ion Etching ◽  
Single Step ◽  
Ion Etching ◽  
Deep Reactive Ion Etching

Realization of silicon nanopillar arrays with controllable sidewall profiles by holography lithography and a novel single-step deep reactive ion etching

2010 ◽  
Vol 1258 ◽  
Author(s):  
Yung-Jr Hung ◽  
San-Liang Lee ◽  
Brian J. Thibeault ◽  
Larry A. Coldren
Keyword(s):  
Etching Rate ◽  
Reactive Ion Etching ◽  
Single Step ◽  
Gas Mixture ◽  
Optical Performance ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
High Etching Rate ◽  
Sidewall Angle ◽  
Nanopillar Arrays

AbstractA simple and efficient approach for fabricating silicon nanopillar arrays with a high aspect ratio and controllable sidewall profiles has been developed by using holographic lithography and a novel single-step deep reactive ion etching. During the etching process, scalloping of the sidewalls can be avoided while reserving the high mask selectivity and high etching rate. Besides, the sidewall angle of resultant patterns can be adjusted by tuning the composition of the gas mixture of single-step DRIE process. We further fabricate a tapered silicon nanopillar array and observe its photonic bandgap property. We believe that the good optical performance of this tapered silicon nanopillar array realized by the proposed approach shows the promising of this process for various applications.

Streamlined cryogenic deep reactive ion etching protocol for hybrid micronozzle arrays

2011 ◽  
Vol 21 (10) ◽  
pp. 105001
Author(s):  
Ahmet Erten ◽  
Milan Makale ◽  
Xuekun Lu ◽  
Bernd Fruhberger ◽  
Santosh Kesari ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching

scholarly journals Correction to Ultrahigh Resolution Titanium Deep Reactive Ion Etching

2017 ◽  
Vol 9 (27) ◽  
pp. 23263-23263
Author(s):  
Bryan W. K. Woo ◽  
Shannon C. Gott ◽  
Ryan A. Peck ◽  
Dong Yan ◽  
Mathias W. Rommelfanger ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Ultrahigh Resolution ◽  
Ion Etching ◽  
Deep Reactive Ion Etching

Deep reactive ion etching of sub-micrometer trenches with ultra high aspect ratio

2014 ◽  
Vol 113 ◽  
pp. 35-39 ◽  
Author(s):  
Jayalakshmi Parasuraman ◽  
Anand Summanwar ◽  
Frédéric Marty ◽  
Philippe Basset ◽  
Dan E. Angelescu ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching

Modeling and simulation of the lag effect in a deep reactive ion etching process

2006 ◽  
Vol 16 (12) ◽  
pp. 2570-2575 ◽  
Author(s):  
Yiyong Tan ◽  
Rongchun Zhou ◽  
Haixia Zhang ◽  
Guizhang Lu ◽  
Zhihong Li
Keyword(s):  
Modeling And Simulation ◽  
Reactive Ion Etching ◽  
Etching Process ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
Lag Effect
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