Investigations on the correlation between surface texturing histogram and the spectral reflectance of (100) Crystalline Silicon Substrate textured using anisotropic etching

2017 ◽  
Vol 263 ◽  
pp. 445-450 ◽  
Author(s):  
B.S. Akila ◽  
K. Vaithinathan ◽  
T. Balaganapathi ◽  
S. Vinoth ◽  
P. Thilakan
Keyword(s):  
Silicon Substrate ◽  
Spectral Reflectance ◽  
Crystalline Silicon ◽  
Surface Texturing ◽  
Anisotropic Etching

Surface-Texturing of Single-Crystalline Silicon Wafers

2011 ◽  
Vol 479 ◽  
pp. 124-131 ◽  
Author(s):  
Jian Yang Lin ◽  
Pai Yu Chang ◽  
Chih Kai Hu ◽  
Bin Hon Wu
Keyword(s):  
Solar Cells ◽  
Crystalline Silicon ◽  
Incident Light ◽  
Surface Texturing ◽  
Front Surface ◽  
Anisotropic Etching ◽  
Silicon Wafers ◽  
Surface Reflectance ◽  
Single Crystalline Silicon ◽  
Single Crystalline

In this work, alkaline-based anisotropic etchants, tetramethylammonium hydroxide (TMAH) and potassium hydroxide (KOH)/isopropyl alcohol (IPA) solutions, have been used for the surface texturing of the single-crystalline silicon wafers used for solar cells. The pyramid morphology produced by the surface texturing can reduce the surface reflection of the incident light and increase the light absorption so that the efficiency of the solar cells can be increased. The experimental data shows that the optimized surface texturing has been obtained with 5 wt. % TMAH anisotropic etching at 80 °C. The surface reflectance of the polished front surface can be reduced to 17 % and the surface reflectance of the unpolished backside surface can be reduced to 3 %, respectively. This result shows that the anisotropic etching can effectively reduce the surface reflectance. While for the surface texturing with KOH/IPA mixture, the front surface reflectance can only be reduced to 35 % and the backside surface reflectance can only be reduced to 5 %, respectively. Besides, debris of Si nano-crystals exists around the pyramid base area when texturing with the KOH/IPA mixture.

Micro- and Nanotextured Silicon for Antireflective Coatings of Solar Cells

2016 ◽  
Vol 39 ◽  
pp. 89-95 ◽  
Author(s):  
Anatoly Druzhinin ◽  
Valery Yerokhov ◽  
Stepan Nichkalo ◽  
Yevhen Berezhanskyi
Keyword(s):  
Solar Cells ◽  
Conversion Efficiency ◽  
Silicon Substrate ◽  
Chemical Etching ◽  
Silicon Surface ◽  
Crystalline Silicon ◽  
Silicon Surfaces ◽  
Antireflective Coatings ◽  
High Conversion Efficiency ◽  
Industrial Use

The paper deals with obtaining of textured silicon surfaces by chemical etching. As a result of experiments based on the modification and optimization of obtaining a textured silicon, several methods of chemical texturing of the crystalline silicon surface were developed. It was shown that modified isotropic and anisotropic etching methods are applicable to create a microrelief on the surface of silicon substrate. These methods in addition to their high conversion efficiency can be used for both mono- and multicrystalline silicon which would ensure their industrial use.

Fabrication of controllable wettability of crystalline silicon surfaces by laser surface texturing and silanization

2019 ◽  
Vol 497 ◽  
pp. 143805 ◽  
Author(s):  
Chengjuan Yang ◽  
Xiubing Jing ◽  
Fujun Wang ◽  
Kornel F. Ehmann ◽  
Yanling Tian ◽  
...  
Keyword(s):  
Crystalline Silicon ◽  
Surface Texturing ◽  
Laser Surface ◽  
Silicon Surfaces ◽  
Laser Surface Texturing

Improving the Performance of Light Trapping in Crystalline Silicon Solar Cell through Effective Surface Texturing

2015 ◽  
Vol 1132 ◽  
pp. 144-159 ◽  
Author(s):  
A.A. Fashina ◽  
K.K. Adama ◽  
M.G. Zebaze Kana ◽  
Winston O. Soboyejo
Keyword(s):  
Solar Cells ◽  
Surface Morphology ◽  
Crystalline Silicon ◽  
Light Trapping ◽  
Surface Texturing ◽  
Visible Spectrum ◽  
Silicon Solar Cells ◽  
Etching Time ◽  
Crystalline Silicon Solar Cell ◽  
Light Rays

We investigate the effect of surface texturing on the light trapping properties of Silicon wafers as a function of reflection reduction and surface morphology. This was achieved by structuring a random square-based pyramids pattern on the surface of Silicon substrate using anisotropy etching. The light trapping effect was optimized for silicon solar cells by investigating the dependence of the silicon surface texturing on the process parameters such as etchant concentration, etching time and temperature. We study the surface morphology by analyzing the surface behaviour of the textured substrate using the atomic force microscope and scanning electron microscope. The results of roughness and optical reflection were obtained using the surface profiler and the UV/VIS the spectrometer respectively. In addition, an analytical modelling method was developed to determine the angles of incidence of light rays with each of the facets of the pyramids and the coordinate of the reflected light rays. The method used here is based on 3-D vector geometry of the pyramidal facets. The optimum parameters are found to be 40min, a temperature of 80oC and with KOH/IPA/DI in the ratio [2:4:46] by volume, yielding a surface roughness over 600 nm and a relative optical reflectance in the visible spectrum less than 10%, using polished Si as reference. The results and analysis of both the modelled and measured reflectance, suggest that the performance of the light trapping technique has a big potential in silicon solar cells application.

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