Effect of negative self-bias voltage on microstructure and properties of DLC films deposited by RF glow discharge

2007 ◽  
Vol 201 (9-11) ◽  
pp. 5043-5045 ◽  
Author(s):  
Wei Gou ◽  
Guoqing Li ◽  
Xinpu Chu ◽  
Bin Zhong
1980 ◽  
Vol 13 (6) ◽  
pp. L101-L105 ◽  
Author(s):  
D Mangalaraj ◽  
M Radhakrishnan ◽  
C Balasubramanian ◽  
A R Kasilingam

1995 ◽  
Vol 142 (5) ◽  
pp. 1663-1666 ◽  
Author(s):  
Ahalapitiya Hewage Jayatissa ◽  
Yoichiro Nakanishi ◽  
Yosinori Hatanaka

1987 ◽  
Vol 98 ◽  
Author(s):  
S. E. Savas

ABSTRACTThe dependences of the electrode self-bias voltage and the ratio of ion energies on electrode area ratio are calculated for a model of capacitively coupled rf discharges. It is assumed that concentric spherical elecrodes with fluid-like radial ion flow adequately models the ion motion, that sheath impedances are dominant, and that ionization processes in the glow are due to ohmically heated electrons. Results show that the ratio of ion energies impacting the smaller electrode to those on the larger depends on the ratio of electrode areas in a more complex manner than a power law.The reason for this is that sheath impedances are more resistive or capacitive at different times in the rf cycle. The self-bias ratio is found to depend relatively little on the ionization model or the pressure but differs substantially from the “power law” result. The agreement of measurements with the model is fairly good.


2020 ◽  
Vol 149 ◽  
pp. 105927
Author(s):  
Štěpánka Kelarová ◽  
Vojtěch Homola ◽  
Monika Stupavká ◽  
Martin Čermák ◽  
Jiří Vohánka ◽  
...  

2009 ◽  
Vol 11 (7) ◽  
pp. 1817-1822 ◽  
Author(s):  
Leron Vandsburger ◽  
Edward J. Swanson ◽  
Jason Tavares ◽  
Jean-Luc Meunier ◽  
Sylvain Coulombe

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