Preparation of highly conductive p-type μc-Si:H window layer using lower concentration of hydrogen in the rf glow discharge plasma
1997 ◽
Vol 45
(4)
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pp. 413-421
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2007 ◽
Vol 42
(24)
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pp. 9920-9926
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2014 ◽
Vol 02
(01)
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pp. 1005
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1993 ◽
Vol 29
(3)
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pp. 195-200
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Keyword(s):
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1999 ◽
Vol 38
(Part 1, No. 7B)
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pp. 4535-4537
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2009 ◽
Vol 267
(18)
◽
pp. 3263-3266
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