Characterization of the properties of high-energy electron irradiated Al-doped ZnO thin films prepared by rf magnetron sputtering using Ar plasma
2011 ◽
Vol 205
(21-22)
◽
pp. 5130-5134
◽
Keyword(s):
Keyword(s):
Keyword(s):
2014 ◽
Vol 23
(5)
◽
pp. 279-283
◽
Keyword(s):
Keyword(s):
2010 ◽
Vol 496
(1-2)
◽
pp. 543-547
◽
Keyword(s):
2011 ◽
Vol 58
(3(1))
◽
pp. 555-559
◽
Keyword(s):
Keyword(s):