High rate deposition of amorphous hydrogenated carbon films by hollow cathode arc PECVD

2012 ◽  
Vol 212 ◽  
pp. 67-71 ◽  
Author(s):  
Burkhard Zimmermann ◽  
Fred Fietzke ◽  
Heidrun Klostermann ◽  
Jan Lehmann ◽  
Frans Munnik ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Carbon Films ◽  
High Rate ◽  
Cathode Arc ◽  
Amorphous Hydrogenated Carbon

High-rate hot hollow cathode arc deposition of chromium and chromium nitride films

2004 ◽  
Vol 188-189 ◽  
pp. 703-707 ◽  
Author(s):  
H. Baránková ◽  
L. Bárdoš ◽  
L.-E. Gustavsson
Keyword(s):  
Hollow Cathode ◽  
High Rate ◽  
Chromium Nitride ◽  
Cathode Arc ◽  
Arc Deposition

Deposition of hard amorphous hydrogenated carbon films by radiofrequency parallel-plate hollow-cathode plasmas

2007 ◽  
Vol 16 (3) ◽  
pp. 616-622 ◽  
Author(s):  
G. Capote ◽  
L.G. Jacobsohn ◽  
M.D. Michel ◽  
C.M. Lepienski ◽  
A.L. Vieira ◽  
...  
Keyword(s):  
Hollow Cathode ◽  
Parallel Plate ◽  
Carbon Films ◽  
Amorphous Hydrogenated Carbon

Diagnostics and modelling of hollow cathode arc plasma used for deposition of metal–carbon films

1998 ◽  
Vol 14 (5) ◽  
pp. 405-412 ◽  
Author(s):  
A. Buuron ◽  
H. Bolt ◽  
P. Nizot ◽  
F. Koch
Keyword(s):  
Hollow Cathode ◽  
Carbon Films ◽  
Arc Plasma ◽  
Cathode Arc

Diamond Growth by Dual Hollow Cathode Arc Chemical Vapor Deposition

1997 ◽  
Vol 36 (Part 2, No. 10B) ◽  
pp. L1406-L1409 ◽  
Author(s):  
Gou-Tsau Liang ◽  
Franklin Chau-Nan Hong
Keyword(s):  
Chemical Vapor Deposition ◽  
Hollow Cathode ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Diamond Growth ◽  
Cathode Arc

scholarly journals Characterization of amorphous hydrogenated carbon films deposited by MFPUMST at different ratios of mixed gases

2012 ◽  
Vol 35 (7) ◽  
pp. 1087-1091
Author(s):  
HAIYANG DAI ◽  
CHANGYONG ZHAN ◽  
HUI JIANG ◽  
NINGKANG HUANG
Keyword(s):  
Carbon Films ◽  
Mixed Gases ◽  
Amorphous Hydrogenated Carbon
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