Structure and physical properties of plasma-grown amorphous hydrogenated carbon films

1987 ◽  
Vol 146 (1) ◽  
pp. 93-107 ◽  
Author(s):  
P. Couderc ◽  
Y. Catherine
Keyword(s):  
Physical Properties ◽  
Carbon Films ◽  
Amorphous Hydrogenated Carbon

Investigation on physical properties and structure of amorphous hydrogenated carbon films

1988 ◽  
Vol 101 (2-3) ◽  
pp. 179-186 ◽  
Author(s):  
F. Demichelis ◽  
M. Fanciulli ◽  
G. Kaniadakis ◽  
A. Tagliaferro ◽  
E. Tresso ◽  
...  
Keyword(s):  
Physical Properties ◽  
Carbon Films ◽  
Amorphous Hydrogenated Carbon

scholarly journals Characterization of amorphous hydrogenated carbon films deposited by MFPUMST at different ratios of mixed gases

2012 ◽  
Vol 35 (7) ◽  
pp. 1087-1091
Author(s):  
HAIYANG DAI ◽  
CHANGYONG ZHAN ◽  
HUI JIANG ◽  
NINGKANG HUANG
Keyword(s):  
Carbon Films ◽  
Mixed Gases ◽  
Amorphous Hydrogenated Carbon

Optical properties of amorphous hydrogenated carbon films: A spectroscopic ellipsometry study

1987 ◽  
Vol 2 (5) ◽  
pp. 645-647 ◽  
Author(s):  
Shuhan Lin ◽  
Shuguang Chen
Keyword(s):  
Optical Properties ◽  
Spectroscopic Ellipsometry ◽  
Carbon Films ◽  
Index Of Refraction ◽  
The Real ◽  
Complex Index ◽  
Tentative Explanation ◽  
Amorphous Hydrogenated Carbon ◽  
Ellipsometry Data ◽  
Complex Index Of Refraction

Optical properties of plasma-deposited amorphous hydrogenated carbon films were studied by spectroscopic ellipsometry. From the ellipsometry data, the real and imaginary parts, n and k, of the complex index of refraction of the film have been deduced for photon energies between 2.0 and 4.0 eV for as-grown as well as for thermally annealed films. Here n and k showed considerable variation with subsequent annealing, even under 400°C. A tentative explanation of the results is proposed.

scholarly journals Reactivity of soft amorphous hydrogenated carbon films in ambient atmosphere

2007 ◽  
Vol 363-365 ◽  
pp. 944-948 ◽  
Author(s):  
E. Salançon ◽  
T. Dürbeck ◽  
T. Schwarz-Selinger ◽  
W. Jacob
Keyword(s):  
Carbon Films ◽  
Ambient Atmosphere ◽  
Amorphous Hydrogenated Carbon

Selective deposition of amorphous hydrogenated carbon films used as masks for reactive ion etching of Si using CF4

Vacuum ◽  
1999 ◽  
Vol 52 (3) ◽  
pp. 313-314 ◽  
Author(s):  
Marco AR Alves ◽  
Olga Balachova ◽  
Edmundo da Silva Braga ◽  
Lucila Cescato
Keyword(s):  
Reactive Ion Etching ◽  
Carbon Films ◽  
Selective Deposition ◽  
Ion Etching ◽  
Amorphous Hydrogenated Carbon

Electrical conductivity of as‐prepared and annealed amorphous hydrogenated carbon films

1990 ◽  
Vol 8 (3) ◽  
pp. 1509-1513 ◽  
Author(s):  
A. Reyes‐Mena ◽  
J. González‐Hernández ◽  
R. Asomoza ◽  
B. S. Chao
Keyword(s):  
Electrical Conductivity ◽  
Carbon Films ◽  
Amorphous Hydrogenated Carbon
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