Quantitative investigation of the role of high-energy particles in Al2O3 thin film growth: A molecular-dynamics study

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2014.05.072 ◽

2014 ◽

Vol 254 ◽

pp. 131-137 ◽

Author(s):

Jiri Houska

Keyword(s):

Thin Film ◽

Molecular Dynamics ◽

Film Growth ◽

High Energy ◽

Thin Film Growth ◽

Quantitative Investigation ◽

High Energy Particles ◽

Al2o3 Thin Film

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Molecular Dynamics Simulation of the Physics of Thin Film Growth on Silicon: Effects of the Properties of Interatomic Potential Models

Atomistic Simulation of Materials ◽

10.1007/978-1-4684-5703-2_14 ◽

1989 ◽

pp. 139-145

Author(s):

W. Lowell Morgan

Keyword(s):

Thin Film ◽

Molecular Dynamics ◽

Molecular Dynamics Simulation ◽

Film Growth ◽

Interatomic Potential ◽

Thin Film Growth ◽

Dynamics Simulation ◽

Potential Models

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The role of hydride coverage in surface‐limited thin‐film growth of epitaxial silicon and germanium

Journal of Applied Physics ◽

10.1063/1.355014 ◽

1993 ◽

Vol 74 (12) ◽

pp. 7241-7250 ◽

Author(s):

Gyula Eres ◽

J. W. Sharp

Keyword(s):

Thin Film ◽

Film Growth ◽

Thin Film Growth ◽

Epitaxial Silicon ◽

Silicon And Germanium

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Spectroscopies combined with reflection high-energy electron diffraction (RHEED) for real-time in situ surface monitoring of thin film growth

In Situ Characterization of Thin Film Growth ◽

10.1533/9780857094957.3.180 ◽

2011 ◽

pp. 180-211 ◽

Author(s):

P.G. Staib

Keyword(s):

Thin Film ◽

Electron Diffraction ◽

Real Time ◽

Film Growth ◽

High Energy ◽

Thin Film Growth ◽

Energy Electron ◽

High Energy Electron ◽

Surface Monitoring

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Accelerated Molecular-Dynamics Simulation of Thin Film Growth

Springer Proceedings in Physics - Computer Simulation Studies in Condensed-Matter Physics XIX ◽

10.1007/978-3-540-85625-2_2 ◽

2008 ◽

pp. 7-16 ◽

Author(s):

K. A. Fichthorn ◽

R. A. Miron

Keyword(s):

Thin Film ◽

Molecular Dynamics ◽

Molecular Dynamics Simulation ◽

Film Growth ◽

Thin Film Growth ◽

Dynamics Simulation ◽

Accelerated Molecular Dynamics

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Reflection high-energy electron diffraction (RHEED) for in situ characterization of thin film growth

In Situ Characterization of Thin Film Growth ◽

10.1533/9780857094957.1.3 ◽

2011 ◽

pp. 3-28 ◽

Author(s):

G. Koster

Keyword(s):

Thin Film ◽

Electron Diffraction ◽

Film Growth ◽

High Energy ◽

Thin Film Growth ◽

Energy Electron ◽

High Energy Electron ◽

In Situ Characterization

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Molecular dynamics simulations of multilayer homoepitaxial thin film growth in the diffusion-limited regime

Surface Science ◽

10.1016/s0039-6028(97)00560-8 ◽

1997 ◽

Vol 393 (1-3) ◽

pp. 72-84 ◽

Author(s):

Cynthia L. Kelchner ◽

Andrew E. DePristo

Keyword(s):

Thin Film ◽

Molecular Dynamics ◽

Molecular Dynamics Simulations ◽

Film Growth ◽

Thin Film Growth ◽

Diffusion Limited ◽

Dynamics Simulations

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Role of CH2I2 catalysis in chemically enhanced MOCVD Cu process: Nature of superfilling in copper thin film growth

Metals and Materials International ◽

10.3365/met.mat.2008.12.767 ◽

2008 ◽

Vol 14 (6) ◽

pp. 767-772 ◽

Author(s):

Sung Gyu Pyo

Keyword(s):

Thin Film ◽

Film Growth ◽

Thin Film Growth ◽

Copper Thin Film

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A two‐dimensional molecular dynamics simulation of thin film growth by oblique deposition

Journal of Applied Physics ◽

10.1063/1.363621 ◽

1996 ◽

Vol 80 (10) ◽

pp. 5682-5690 ◽

Author(s):

Liang Dong ◽

Richard W. Smith ◽

David J. Srolovitz

Keyword(s):

Thin Film ◽

Molecular Dynamics ◽

Molecular Dynamics Simulation ◽

Film Growth ◽

Thin Film Growth ◽

Dynamics Simulation ◽

Two Dimensional ◽

Oblique Deposition

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Unraveling the deposition mechanism in a-C:H thin-film growth: A molecular-dynamics study for the reaction behavior of C3 and C3H radicals with a-C:H surfaces

Journal of Applied Physics ◽

10.1063/1.2150149 ◽

2006 ◽

Vol 99 (1) ◽

pp. 014902 ◽

Author(s):

E. Neyts ◽

A. Bogaerts ◽

M. C. M. van de Sanden

Keyword(s):

Thin Film ◽

Molecular Dynamics ◽

Film Growth ◽

Thin Film Growth ◽

Deposition Mechanism ◽

Reaction Behavior

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A versatile high energy scanning electron diffraction system for observing thin film growth in ultra-high vacuum and in a low gas pressure

Journal of Physics E Scientific Instruments ◽

10.1088/0022-3735/2/7/308 ◽

1969 ◽

Vol 2 (7) ◽

pp. 587-590 ◽

Author(s):

M F Tompsett ◽

D E Sedgewick ◽

J St Noble

Keyword(s):

Thin Film ◽

Electron Diffraction ◽

Film Growth ◽

High Vacuum ◽

High Energy ◽

Gas Pressure ◽

Thin Film Growth ◽

Ultra High Vacuum ◽

Scanning Electron

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