Graded metal carbon protein binding films prepared by hybrid cathodic arc — Glow discharge plasma assisted chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2014.11.025 ◽

2015 ◽

Vol 265 ◽

pp. 222-234 ◽

Cited By ~ 8

Author(s):

Mohammed Ibrahim Jamesh ◽

R.L. Boxman ◽

Neil J. Nosworthy ◽

I.S. Falconer ◽

Paul K. Chu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Glow Discharge ◽

Protein Binding ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Glow Discharge Plasma ◽

Cathodic Arc

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Evaluation of corrosion resistance and cytocompatibility of graded metal carbon film on Ti and NiTi prepared by hybrid cathodic arc/glow discharge plasma-assisted chemical vapor deposition

Corrosion Science ◽

10.1016/j.corsci.2015.04.022 ◽

2015 ◽

Vol 97 ◽

pp. 126-138 ◽

Cited By ~ 25

Author(s):

Mohammed Ibrahim Jamesh ◽

Penghui Li ◽

Marcela M.M. Bilek ◽

R.L. Boxman ◽

David R. McKenzie ◽

...

Keyword(s):

Corrosion Resistance ◽

Chemical Vapor Deposition ◽

Glow Discharge ◽

Vapor Deposition ◽

Discharge Plasma ◽

Carbon Film ◽

Chemical Vapor ◽

Glow Discharge Plasma ◽

Cathodic Arc

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Understanding growth of carbon nanowalls at atmospheric pressure using normal glow discharge plasma-enhanced chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2011.01.007 ◽

2011 ◽

Vol 49 (6) ◽

pp. 1849-1858 ◽

Cited By ~ 96

Author(s):

Zheng Bo ◽

Kehan Yu ◽

Ganhua Lu ◽

Pengxiang Wang ◽

Shun Mao ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Glow Discharge ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Discharge Plasma ◽

Chemical Vapor ◽

Glow Discharge Plasma ◽

Carbon Nanowalls ◽

Normal Glow Discharge

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Progress Report on the Application of a One Atmosphere Uniform Glow Discharge Plasma (OAUGDP®) to Plasma Chemical Vapor Deposition (PCVD)

IEEE Conference Record - Abstracts. 2005 IEEE International Conference on Plasma Science ◽

10.1109/plasma.2005.359289 ◽

2005 ◽

Author(s):

Truman Bonds ◽

J. Reece Roth

Keyword(s):

Chemical Vapor Deposition ◽

Glow Discharge ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Progress Report ◽

Glow Discharge Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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One atmosphere uniform glow discharge plasma (OAUGDP) reactor for plasma chemical vapor deposition (PCVD) of thin films

IEEE Conference Record - Abstracts 2002 IEEE International Conference on Plasma Science (Cat No 02CH37340) PLASMA-02 ◽

10.1109/plasma.2002.1030554 ◽

2003 ◽

Cited By ~ 1

Author(s):

Zhiyu Chen ◽

J.R. Roth

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Glow Discharge ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Glow Discharge Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Effects of pulse voltage and deposition time on the adhesion strength of graded metal/carbon films deposited on bendable stainless steel foils by hybrid cathodic arc – glow discharge plasma assisted chemical vapor deposition

Applied Surface Science ◽

10.1016/j.apsusc.2016.01.121 ◽

2016 ◽

Vol 366 ◽

pp. 535-544 ◽

Cited By ~ 2

Author(s):

Mohammed Ibrahim Jamesh ◽

R.L. Boxman ◽

Marcela M.M. Bilek ◽

Cenk Kocer ◽

Tingwei Hu ◽

...

Keyword(s):

Stainless Steel ◽

Vapor Deposition ◽

Deposition Time ◽

Discharge Plasma ◽

Chemical Vapor ◽

Carbon Films ◽

Glow Discharge Plasma ◽

Stainless Steel Foils ◽

Cathodic Arc ◽

Steel Foils

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Direct Current Discharge Plasma Chemical Vapor Deposition of Nanocrystalline Graphite Films on Carbon Fibers

The Journal of Physical Chemistry C ◽

10.1021/jp801615w ◽

2008 ◽

Vol 112 (29) ◽

pp. 10735-10739 ◽

Cited By ~ 8

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Wentao Qi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Fibers ◽

Direct Current ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Discharge ◽

Nanocrystalline Graphite

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Diamond Nuclei on the Silicon Mirror Surface by Direct-Current Glow Discharge Chemical Vapor Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/11/3/015 ◽

1994 ◽

Vol 11 (3) ◽

pp. 185-188 ◽

Cited By ~ 4

Author(s):

Chunxiao Gao ◽

Guangtian Zou ◽

Zengsun Jin

Keyword(s):

Chemical Vapor Deposition ◽

Glow Discharge ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Mirror Surface

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Radial distribution of C 4 H 8 –H 2 –TMS plasma during plasma‐enhanced chemical vapor deposition of Si‐doped glow discharge polymers

Plasma Processes and Polymers ◽

10.1002/ppap.201900075 ◽

2019 ◽

Vol 17 (3) ◽

pp. 1900075

Author(s):

Xing Ai ◽

Xiao‐Shan He ◽

Guo Chen ◽

Ling Zhang ◽

Jing‐Lin Huang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Glow Discharge ◽

Radial Distribution ◽

Vapor Deposition ◽

Chemical Vapor ◽

Si Doped

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Characterizations of the dc discharge plasma during chemical vapor deposition for diamond growth

Applied Physics Letters ◽

10.1063/1.99790 ◽

1988 ◽

Vol 53 (19) ◽

pp. 1818-1819 ◽

Cited By ~ 36

Author(s):

Kazuhiro Suzuki ◽

Atsuhito Sawabe ◽

Tadao Inuzuka

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Dc Discharge

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Influence of geometry factors of in situ dc glow discharge on the diamond nucleation in a hot-filament chemical vapor deposition system

Surface and Coatings Technology ◽

10.1016/s0257-8972(00)00907-5 ◽

2000 ◽

Vol 132 (2-3) ◽

pp. 256-261 ◽

Cited By ~ 7

Author(s):

G.F Zhang ◽

V Buck

Keyword(s):

Chemical Vapor Deposition ◽

Glow Discharge ◽

Vapor Deposition ◽

Chemical Vapor ◽

Dc Glow Discharge ◽

Diamond Nucleation ◽

Hot Filament

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