Progress Report on the Application of a One Atmosphere Uniform Glow Discharge Plasma (OAUGDP®) to Plasma Chemical Vapor Deposition (PCVD)

Author(s):  
Truman Bonds ◽  
J. Reece Roth
1994 ◽  
Vol 33 (Part 1, No. 7B) ◽  
pp. 4400-4403 ◽  
Author(s):  
Mikio Noda ◽  
Hiroshi Kusakabe ◽  
Kazuya Taniguchi ◽  
Shigeo Maruno

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