Understanding growth of carbon nanowalls at atmospheric pressure using normal glow discharge plasma-enhanced chemical vapor deposition

Zheng Bo; Kehan Yu; Ganhua Lu; Pengxiang Wang; Shun Mao; Junhong Chen

doi:10.1016/j.carbon.2011.01.007

Understanding growth of carbon nanowalls at atmospheric pressure using normal glow discharge plasma-enhanced chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2011.01.007 ◽

2011 ◽

Vol 49 (6) ◽

pp. 1849-1858 ◽

Cited By ~ 96

Author(s):

Zheng Bo ◽

Kehan Yu ◽

Ganhua Lu ◽

Pengxiang Wang ◽

Shun Mao ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Glow Discharge ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Discharge Plasma ◽

Chemical Vapor ◽

Glow Discharge Plasma ◽

Carbon Nanowalls ◽

Normal Glow Discharge

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Evaluation of corrosion resistance and cytocompatibility of graded metal carbon film on Ti and NiTi prepared by hybrid cathodic arc/glow discharge plasma-assisted chemical vapor deposition

Corrosion Science ◽

10.1016/j.corsci.2015.04.022 ◽

2015 ◽

Vol 97 ◽

pp. 126-138 ◽

Cited By ~ 25

Author(s):

Mohammed Ibrahim Jamesh ◽

Penghui Li ◽

Marcela M.M. Bilek ◽

R.L. Boxman ◽

David R. McKenzie ◽

...

Keyword(s):

Corrosion Resistance ◽

Chemical Vapor Deposition ◽

Glow Discharge ◽

Vapor Deposition ◽

Discharge Plasma ◽

Carbon Film ◽

Chemical Vapor ◽

Glow Discharge Plasma ◽

Cathodic Arc

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Graded metal carbon protein binding films prepared by hybrid cathodic arc — Glow discharge plasma assisted chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2014.11.025 ◽

2015 ◽

Vol 265 ◽

pp. 222-234 ◽

Cited By ~ 8

Author(s):

Mohammed Ibrahim Jamesh ◽

R.L. Boxman ◽

Neil J. Nosworthy ◽

I.S. Falconer ◽

Paul K. Chu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Glow Discharge ◽

Protein Binding ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Glow Discharge Plasma ◽

Cathodic Arc

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Progress Report on the Application of a One Atmosphere Uniform Glow Discharge Plasma (OAUGDP®) to Plasma Chemical Vapor Deposition (PCVD)

IEEE Conference Record - Abstracts. 2005 IEEE International Conference on Plasma Science ◽

10.1109/plasma.2005.359289 ◽

2005 ◽

Author(s):

Truman Bonds ◽

J. Reece Roth

Keyword(s):

Chemical Vapor Deposition ◽

Glow Discharge ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Progress Report ◽

Glow Discharge Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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One atmosphere uniform glow discharge plasma (OAUGDP) reactor for plasma chemical vapor deposition (PCVD) of thin films

IEEE Conference Record - Abstracts 2002 IEEE International Conference on Plasma Science (Cat No 02CH37340) PLASMA-02 ◽

10.1109/plasma.2002.1030554 ◽

2003 ◽

Cited By ~ 1

Author(s):

Zhiyu Chen ◽

J.R. Roth

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Glow Discharge ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Glow Discharge Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Synthesis of carbon nanowalls by the method of plasma enhanced chemical vapor deposition in a radio-frequency discharge plasma

Recent Contributions to Physics ◽

10.26577/rcph-2019-1-1099 ◽

2019 ◽

Vol 68 (1) ◽

pp. 68-73

Author(s):

Ye. Yerlanuly ◽

◽

D.G. Batryshev ◽

M. Hori ◽

◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Radio Frequency ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Carbon Nanowalls ◽

Radio Frequency Discharge

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Atmospheric pressure chemical vapor deposition of blanket tungsten films on silicon substrates for integrated circuit applications

Journal of Electronic Materials ◽

10.1007/bf02659737 ◽

1995 ◽

Vol 24 (6) ◽

pp. 761-766 ◽

Cited By ~ 4

Author(s):

M. S. Haque ◽

U. V. Patel ◽

H. A. Naseem ◽

W. D. Brown

Keyword(s):

Chemical Vapor Deposition ◽

Integrated Circuit ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Silicon Substrates ◽

Pressure Chemical

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Electrical Characteristics of Magnesium Doped a-IGZO RRAM: Chemical Vapor Deposition using Enhanced Atmospheric Pressure-Plasma

2020 IEEE Eurasia Conference on IOT, Communication and Engineering (ECICE) ◽

10.1109/ecice50847.2020.9301987 ◽

2020 ◽

Author(s):

Chien-Hung Wu ◽

Song-Nian Kuo ◽

Yi-Ming Chen ◽

Kow-Ming Chang ◽

Yu Yang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Atmospheric Pressure Plasma ◽

Chemical Vapor ◽

Electrical Characteristics ◽

Pressure Plasma

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Growth of Single-Crystal Pyrite Films by Atmospheric Pressure Chemical Vapor Deposition

Chemistry of Materials ◽

10.1021/cm0210243 ◽

2003 ◽

Vol 15 (9) ◽

pp. 1763-1765 ◽

Cited By ~ 20

Author(s):

Naoyuki Takahashi ◽

Yusuke Nakatani ◽

Takuma Yatomi ◽

Takato Nakamura

Keyword(s):

Chemical Vapor Deposition ◽

Single Crystal ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Pressure Chemical

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Photo-initiated chemical vapor deposition of thin films using syngas for the functionalization of surfaces at room temperature and near-atmospheric pressure

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2014.01.043 ◽

2014 ◽

Vol 244 ◽

pp. 98-108 ◽

Cited By ~ 19

Author(s):

C.A. Dorval Dion ◽

W. Raphael ◽

E. Tong ◽

J.R. Tavares

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Room Temperature ◽

Chemical Vapor ◽

Initiated Chemical Vapor Deposition

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Reaction Mechanism of Chemical Vapor Deposition Using Tetraethylorthosilicate and Ozone at Atmospheric Pressure

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.2925 ◽

1992 ◽

Vol 31 (Part 1, No. 9A) ◽

pp. 2925-2930 ◽

Cited By ~ 32

Author(s):

Takaaki Kawahara ◽

Akimasa Yuuki ◽

Yasuji Matsui

Keyword(s):

Chemical Vapor Deposition ◽

Reaction Mechanism ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor

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