Effects of radio-frequency plasma on structure and properties in Ti film deposition by dc and pulsed dc magnetron sputtering

2009 ◽  
Vol 517 (20) ◽  
pp. 5837-5843 ◽  
Author(s):  
Toshiyuki Oya ◽  
Eiji Kusano
Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang

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