Stress measurement in thin films with the ion beam layer removal method: Influence of experimental errors and parameters

2008 ◽  
Vol 516 (23) ◽  
pp. 8655-8662 ◽  
Author(s):  
S. Massl ◽  
H. Köstenbauer ◽  
J. Keckes ◽  
R. Pippan
Keyword(s):  
Thin Films ◽  
Stress Measurement ◽  
Ion Beam ◽  
Removal Method ◽  
Layer Removal ◽  
Layer Removal Method ◽  
Experimental Errors

scholarly journals Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method

2014 ◽  
Vol 564 ◽  
pp. 321-330 ◽  
Author(s):  
R. Schöngrundner ◽  
R. Treml ◽  
T. Antretter ◽  
D. Kozic ◽  
W. Ecker ◽  
...  
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Ion Beam ◽  
Critical Assessment ◽  
Removal Method ◽  
Layer Removal ◽  
Layer Removal Method ◽  
Stress Profiles

scholarly journals A modified layer-removal method for residual stress measurement in electrodeposited nickel films

2011 ◽  
Vol 519 (10) ◽  
pp. 3249-3253 ◽  
Author(s):  
L.M. Jiang ◽  
J. Peng ◽  
Y.G. Liao ◽  
Y.C. Zhou ◽  
J. Liang ◽  
...  
Keyword(s):  
Residual Stress ◽  
Stress Measurement ◽  
Residual Stress Measurement ◽  
Nickel Films ◽  
Removal Method ◽  
Layer Removal ◽  
Layer Removal Method ◽  
Electrodeposited Nickel ◽  
Modified Layer

Residual stress measurement in thin films at sub-micron scale using Focused Ion Beam milling and imaging

2012 ◽  
Vol 520 (6) ◽  
pp. 2073-2076 ◽  
Author(s):  
Xu Song ◽  
Kong Boon Yeap ◽  
Jing Zhu ◽  
Jonathan Belnoue ◽  
Marco Sebastiani ◽  
...  
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Focused Ion Beam ◽  
Stress Measurement ◽  
Ion Beam ◽  
Residual Stress Measurement ◽  
Focused Ion Beam Milling
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