Atomic layer deposited aluminum oxide barrier coatings for packaging materials

2010 ◽  
Vol 518 (10) ◽  
pp. 2654-2658 ◽  
Author(s):  
Terhi Hirvikorpi ◽  
Mika Vähä-Nissi ◽  
Tuomas Mustonen ◽  
Eero Iiskola ◽  
Maarit Karppinen
2012 ◽  
Vol 30 (4) ◽  
pp. 041502 ◽  
Author(s):  
Carolin F. Struller ◽  
Peter J. Kelly ◽  
Nick J. Copeland ◽  
Christopher M. Liauw

2017 ◽  
Vol 621 ◽  
pp. 151-155 ◽  
Author(s):  
Petri Johansson ◽  
Hannu Teisala ◽  
Kimmo Lahtinen ◽  
Jurkka Kuusipalo

2011 ◽  
Vol 205 (21-22) ◽  
pp. 5088-5092 ◽  
Author(s):  
Terhi Hirvikorpi ◽  
Mika Vähä-Nissi ◽  
Juha Nikkola ◽  
Ali Harlin ◽  
Maarit Karppinen

Author(s):  
Sungho Park ◽  
Byung Jun Kim ◽  
Tae Yeon Kim ◽  
Eui Young Jung ◽  
Kyu-Myung Lee ◽  
...  

We have developed a visible-light phototransistor with excellent photodetection characteristics and stability via atomic layer deposition (ALD) to add a thin layer of aluminum oxide (Al2O3) to quantum dot (QD)/zinc oxide (ZnO) films.


2011 ◽  
Vol 334 (1) ◽  
pp. 113-117 ◽  
Author(s):  
Kevin Goodman ◽  
Vladimir Protasenko ◽  
Jai Verma ◽  
Tom Kosel ◽  
Grace Xing ◽  
...  

2010 ◽  
Vol 20 (18) ◽  
pp. 3099-3105 ◽  
Author(s):  
David J. Comstock ◽  
Steven T. Christensen ◽  
Jeffrey W. Elam ◽  
Michael J. Pellin ◽  
Mark C. Hersam

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