Hydrogen-free diamond-like carbon films prepared by microwave electron cyclotron resonance plasma-enhanced direct current magnetron sputtering

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon ◽

Direct Current Magnetron Sputtering ◽

Structure and tribology properties of diamond-like carbon films prepared by microwave electron cyclotron resonance plasma source ion implantation

Acta Physica Sinica ◽

10.7498/aps.54.3241 ◽

2005 ◽

Vol 54 (7) ◽

pp. 3241

Author(s):

Gao Peng ◽

Xu Jun ◽

Deng Xin-Lu ◽

Wang De-He ◽

Dong Chuang

Keyword(s):

Ion Implantation ◽

Cyclotron Resonance ◽

Plasma Source ◽

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon ◽

Plasma Source Ion Implantation ◽

Plasma enhanced direct current planar magnetron sputtering technique employing a twinned microwave electron cyclotron resonance plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1340654 ◽

2001 ◽

Vol 19 (2) ◽

pp. 425-428 ◽

Cited By ~ 4

Author(s):

Xu Jun ◽

Deng Xinlu ◽

Yu Shiji ◽

Lu Wenqi ◽

Ma Tengcai

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Planar Magnetron ◽

Diamond-Like Carbon Film Deposition by Super-Wide Electron-Cyclotron Resonance Plasma Source Excited by Traveling Microwave

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l802 ◽

1993 ◽

Vol 32 (Part 2, No. 6A) ◽

pp. L802-L805 ◽

Cited By ~ 3

Author(s):

Akira Ishii ◽

Yoshiyuki Sakaguchi ◽

Shoichiro Minomo ◽

Michio Taniguchi ◽

Masato Sugiyo ◽

...

Keyword(s):

Cyclotron Resonance ◽

Carbon Film ◽

Plasma Source ◽

Electron Cyclotron ◽

Film Deposition ◽

Diamond Like Carbon ◽

Diamond Like Carbon Film ◽

Dissociative Excitation of C2H2 in the Electron Cyclotron Resonance Plasma of Ar: Production of CH(A2Δ) Radicals and Formation of Hydrogenated Amorphous Carbon Films

Plasma Chemistry and Plasma Processing ◽

10.1007/s11090-012-9355-2 ◽

2012 ◽

Vol 32 (2) ◽

pp. 231-248 ◽

Cited By ~ 4

Author(s):

Haruhiko Ito ◽

Katsuaki Koshimura ◽

Saori Onitsuka ◽

Kohtaro Okada ◽

Tsuneo Suzuki ◽

...

Keyword(s):

Amorphous Carbon ◽

Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Dissociative Excitation ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous ◽

Solid Solubility of Nitrogen in Amorphous Carbon Films Deposited in Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.4983 ◽

1998 ◽

Vol 37 (Part 1, No. 9A) ◽

pp. 4983-4988 ◽

Cited By ~ 21

Author(s):

Hidetoshi Saitoh ◽

Tohru Inoue ◽

Shigeo Ohshio

Keyword(s):

Amorphous Carbon ◽

Solid Solubility ◽

Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Amorphous Carbon Films ◽

Preparation of nitrogen containing carbon films using chemical vapor deposition enhanced by electron cyclotron resonance plasma

Applied Physics Letters ◽

10.1063/1.115442 ◽

1995 ◽

Vol 67 (3) ◽

pp. 353-355 ◽

Cited By ~ 31

Author(s):

Tohru Inoue ◽

Shigeo Ohshio ◽

Hidetoshi Saitoh ◽

Kiichiro Kamata

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Carbon Films ◽

Electron Cyclotron ◽

Electron cyclotron resonance plasma enhanced direct current sputtering discharge with magnetic-mirror plasma confinement

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580660 ◽

1997 ◽

Vol 15 (4) ◽

pp. 1922-1928 ◽

Cited By ~ 12

Author(s):

M. Mišina ◽

Y. Setsuhara ◽

S. Miyake

Keyword(s):

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Magnetic Mirror ◽

Plasma Confinement ◽

Direct Current Sputtering ◽

Relative Irradiance Measurement and Bonding Configurations of Amorphous Fluorinated Carbon Films Deposited by Electron Cyclotron Resonance Plasma

Plasma Science and Technology ◽

10.1088/1009-0630/2/5/008 ◽

2000 ◽

Vol 2 (5) ◽

pp. 469-474 ◽

Cited By ~ 2

Author(s):

Ye Chao ◽

Kang Jian ◽

Ning Zhao-yuan ◽

Cheng Shan-hua

Keyword(s):

Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Irradiance Measurement ◽

Fluorinated Carbon ◽

A New Method for Thin Film Deposition—Faced Microwave Electron Cyclotron Resonance Plasma Sources Enhanced Direct-Current Magnetron Sputtering

Chinese Physics Letters ◽

10.1088/0256-307x/17/8/015 ◽

2000 ◽

Vol 17 (8) ◽

pp. 586-588 ◽

Cited By ~ 6

Author(s):

Xu Jun ◽

Ma Teng-Cai ◽

Lu Wen-Qi ◽

Xia Yuan-Liang ◽

Deng Xin-Lu

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Direct Current ◽

Cyclotron Resonance ◽

Thin Film Deposition ◽

Film Deposition ◽

Plasma Sources ◽

Direct Current Magnetron Sputtering ◽

Influence of a direct current bias on the energy of ions from an electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578167 ◽

1992 ◽

Vol 10 (3) ◽

pp. 434-438 ◽

Cited By ~ 48

Author(s):

P. Reinke ◽

S. Schelz ◽

W. Jacob ◽

W. Möller

Keyword(s):

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron ◽

Direct Current Bias ◽