A New Method for Thin Film Deposition—Faced Microwave Electron Cyclotron Resonance Plasma Sources Enhanced Direct-Current Magnetron Sputtering

Chinese Physics Letters ◽

10.1088/0256-307x/17/8/015 ◽

2000 ◽

Vol 17 (8) ◽

pp. 586-588 ◽

Author(s):

Xu Jun ◽

Ma Teng-Cai ◽

Lu Wen-Qi ◽

Xia Yuan-Liang ◽

Deng Xin-Lu

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Film Deposition ◽

Plasma Sources ◽

Direct Current Magnetron Sputtering ◽

Resonance Plasma

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Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

IEEE Conference Record - Abstracts. 1997 IEEE International Conference on Plasma Science ◽

10.1109/plasma.1997.604953 ◽

2002 ◽

Author(s):

E. Koretzky ◽

S.P. Kuo ◽

S.C. Kuo

Keyword(s):

Thin Film ◽

Experimental Study ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Plasma

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The effect of negative ions from the target on thin film deposition in a direct current magnetron sputtering system

Thin Solid Films ◽

10.1016/j.tsf.2015.03.019 ◽

2015 ◽

Vol 587 ◽

pp. 3-7 ◽

Author(s):

Min Young Hur ◽

Jin Seok Kim ◽

Hae June Lee

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Direct Current ◽

Negative Ions ◽

Thin Film Deposition ◽

Film Deposition ◽

Direct Current Magnetron Sputtering ◽

Sputtering System

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Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

IEEE Conference Record - Abstracts. 1996 IEEE International Conference on Plasma Science ◽

10.1109/plasma.1996.550637 ◽

2002 ◽

Author(s):

E. Koretzky ◽

S.P. Kuo ◽

S.C. Kuo

Keyword(s):

Thin Film ◽

Experimental Study ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Plasma

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Hydrogen-free diamond-like carbon films prepared by microwave electron cyclotron resonance plasma-enhanced direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2010.07.067 ◽

2010 ◽

Vol 519 (1) ◽

pp. 86-90 ◽

Author(s):

Lili Ru ◽

Jianjun Huang ◽

Liang Gao ◽

Bing Qi

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon ◽

Electron Cyclotron Resonance Plasma ◽

Direct Current Magnetron Sputtering ◽

Resonance Plasma

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Dielectric thin film deposition by electron cyclotron resonance plasma chemical vapor deposition for optoelectronics

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587140 ◽

1994 ◽

Vol 12 (1) ◽

pp. 433 ◽

Author(s):

Steven Dzioba

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Thin Film Deposition ◽

Film Deposition ◽

Plasma Chemical ◽

Dielectric Thin Film ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Boron nitride thin film deposition using electron cyclotron resonance microwave plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578514 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1863-1869 ◽

Author(s):

S. M. Gorbatkin ◽

R. F. Burgie ◽

W. C. Oliver ◽

J. C. Barbour ◽

T. M. Mayer ◽

...

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Microwave Plasmas ◽

Resonance Microwave

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Plasma enhanced direct current planar magnetron sputtering technique employing a twinned microwave electron cyclotron resonance plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1340654 ◽

2001 ◽

Vol 19 (2) ◽

pp. 425-428 ◽

Author(s):

Xu Jun ◽

Deng Xinlu ◽

Yu Shiji ◽

Lu Wenqi ◽

Ma Tengcai

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Planar Magnetron ◽

Resonance Plasma

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Hard boron oxide thin‐film deposition using electron cyclotron resonance microwave plasmas

Applied Physics Letters ◽

10.1063/1.112598 ◽

1994 ◽

Vol 65 (21) ◽

pp. 2672-2674 ◽

Author(s):

S. M. Gorbatkin ◽

R. L. Rhoades ◽

T. Y. Tsui ◽

W. C. Oliver

Keyword(s):

Thin Film ◽

Boron Oxide ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Oxide Thin Film ◽

Microwave Plasmas ◽

Resonance Microwave

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Boron nitride thin film deposition from solid borane ammonia using an electron cyclotron resonance microwave plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579646 ◽

1995 ◽

Vol 13 (4) ◽

pp. 2018-2022 ◽

Author(s):

C. R. Eddy ◽

B. D. Sartwell

Keyword(s):

Thin Film ◽

Boron Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Plasma Source ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Resonance Microwave

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Electron cyclotron resonance microwave discharges for etching and thin‐film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575815 ◽

1989 ◽

Vol 7 (3) ◽

pp. 883-893 ◽

Author(s):

Jes Asmussen

Keyword(s):

Thin Film ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Thin Film Deposition ◽

Electron Cyclotron ◽

Film Deposition ◽

Microwave Discharges ◽

Resonance Microwave

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