Effects of annealing temperature on crystallisation kinetics and properties of polycrystalline Si thin films and solar cells on glass fabricated by plasma enhanced chemical vapour deposition

2011 ◽  
Vol 520 (1) ◽  
pp. 543-549 ◽  
Author(s):  
Yuguo Tao ◽  
Sergey Varlamov ◽  
Guangyao Jin ◽  
Michael Wolf ◽  
Renate Egan
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Annealing Temperature ◽  
Chemical Vapour ◽  
Crystallisation Kinetics

scholarly journals A solution based route to GaAs thin films from As(NMe2)3 and GaMe3 for solar cells

RSC Advances ◽  
2015 ◽  
Vol 5 (16) ◽  
pp. 11812-11817 ◽  
Author(s):  
Sanjayan Sathasivam ◽  
Ranga R. Arnepalli ◽  
Kaushal K. Singh ◽  
Robert J. Visser ◽  
Christopher S. Blackman ◽  
...  
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
The Novel ◽  
Glass Substrates

The novel deposition of GaAs thin films on glass substrates from a solution based route involving the aerosol assisted chemical vapour deposition (AACVD) of As(NMe2)3 and GaMe3 dissolved in toluene is reported.

ZnSe thin films grown by chemical vapour deposition for application as buffer layer in CIGSS solar cells

2000 ◽  
Vol 361-362 ◽  
pp. 172-176 ◽  
Author(s):  
A. Rumberg ◽  
Ch. Sommerhalter ◽  
M. Toplak ◽  
A. Jäger-Waldau ◽  
M.Ch. Lux-Steiner
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Buffer Layer ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Znse Thin Films

scholarly journals Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp′)2] (dmamp′ = 2-dimethylamino-2-methyl-1-propanolate)

RSC Advances ◽  
2021 ◽  
Vol 11 (36) ◽  
pp. 22199-22205
Author(s):  
Rachel L. Wilson ◽  
Thomas J. Macdonald ◽  
Chieh-Ting Lin ◽  
Shengda Xu ◽  
Alaric Taylor ◽  
...  
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Hole Transport ◽  
Blocking Layer ◽  
The Novel ◽  
Electron Blocking Layer

We describe CVD of nickel oxide (NiO) thin films using a new precursor [Ni(dmamp′)2], synthesised using a readily commercially available dialkylaminoalkoxide ligand (dmamp′), which is applied to synthesis of a hole transport-electron blocking layer.

Ar stabilisation of the cubic/tetragonal phases of ZrO2 in thin films prepared by ion beam induced chemical vapour deposition

2001 ◽  
Vol 389 (1-2) ◽  
pp. 34-42 ◽  
Author(s):  
J.P Holgado ◽  
J.P Espinós ◽  
F Yubero ◽  
A Justo ◽  
M Ocaña ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Ion Beam ◽  
Chemical Vapour

Growth and characteristics of β-Ga2O3 thin films on sapphire (0001) by low pressure chemical vapour deposition

Vacuum ◽  
2021 ◽  
Vol 189 ◽  
pp. 110253
Author(s):  
Yujia Jiao ◽  
Qian Jiang ◽  
Junhua Meng ◽  
Jinliang Zhao ◽  
Zhigang Yin ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Pressure Chemical
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