Growth temperature dependent dielectric properties of BiFeO3 thin films deposited on silica glass substrates

Zn–In–Se thin films were fabricated on the ultrasonically cleaned glass substrates masked with clover-shaped geometry by thermal evaporation of its elemental sources. Temperature-dependent conductivity characteristics of the films were investigated under dark and illuminated conditions. The semiconductor type of the films was found as n-type by thermal probe test. According to the van der Pauw technique, the dark electrical conductivity analyses showed that the variations of conductivity of unannealed and annealed at [Formula: see text]C samples are in exponential dependence of temperature. These conductivity profiles were found to be dominated by the thermionic emission at high temperature region whereas their behaviors at low temperatures were modeled by hopping theory. On the contrary, as a result of the further annealing temperatures, the surface of the samples showed semi-metallic characteristics with deviating from expected Arrhenius behavior. In addition, the temperature-dependent photoconductivity of the films was analyzed under different illumination intensities and the results were explained by the supra-linear characteristic based on the two-center recombination model.

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Temperature dependent dielectric properties and AC conductivity studies on titanium niobium oxide (TiNb2O7) thin films

Journal of the European Ceramic Society ◽

10.1016/j.jeurceramsoc.2019.11.032 ◽

2020 ◽

Vol 40 (4) ◽

pp. 1293-1300 ◽

Cited By ~ 2

Author(s):

V. Daramalla ◽

Soumyadeep Dutta ◽

Krupanidhi S.B.

Keyword(s):

Thin Films ◽

Dielectric Properties ◽

Ac Conductivity ◽

Niobium Oxide ◽

Temperature Dependent

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Aerosol assisted chemical vapour deposition of transparent conductive ZnO thin films with hexagonal microplate surfaces and ultrahigh haze values

Journal of Materials Chemistry A ◽

10.1039/c5ta06029j ◽

2015 ◽

Vol 3 (44) ◽

pp. 22311-22315 ◽

Cited By ~ 8

Author(s):

Shuqun Chen ◽

Martyn McLachlan ◽

Andrei Sapelkin ◽

Russell Binions

Keyword(s):

Thin Films ◽

Chemical Vapour Deposition ◽

Silica Glass ◽

Vapour Deposition ◽

Chemical Vapour ◽

Zno Thin Films ◽

Textured Surfaces ◽

Glass Substrates

Aerosol assisted chemical vapour deposition has been used to fabricate transparent conductive ZnO thin films with highly hexagonal, textured surfaces and ultra high haze on silica glass substrates.

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914 Transfer method of PZT epitaxial thin films onto glass substrates and evaluation of their dielectric properties

The Proceedings of Conference of Kansai Branch ◽

10.1299/jsmekansai.2005.80._9-27_ ◽

2005 ◽

Vol 2005.80 (0) ◽

pp. _9-27_-_9-28_

Author(s):

Kenichiro TERADA ◽

Takaaki SUZUKI ◽

Isaku KANNO ◽

Hidetoshi KOTERA ◽

Kiyotaka WASA

Keyword(s):

Thin Films ◽

Dielectric Properties ◽

Epitaxial Thin Films ◽

Glass Substrates ◽

Transfer Method

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Effect of composition and growth temperature on the dielectric properties of Pb(ScTa)1−xTixO3(PSTT) thin films grown by MOCVD

Ferroelectrics ◽

10.1080/00150190108008743 ◽

2001 ◽

Vol 259 (1) ◽

pp. 229-238 ◽

Cited By ~ 1

Author(s):

C. H. Lin ◽

P. A. Friddle ◽

C. H. Ma ◽

Haydn Chen

Keyword(s):

Thin Films ◽

Dielectric Properties ◽

Growth Temperature

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OPTICAL WAVEGUIDE FABRICATION AND REFRACTIVE INDEX CHARACTERIZATION OF Nd:LuVO4 THIN FILMS BY PULSED LASER DEPOSITION

Surface Review and Letters ◽

10.1142/s0218625x07010652 ◽

2007 ◽

Vol 14 (06) ◽

pp. 1079-1082 ◽

Cited By ~ 4

Author(s):

HONGXIA LI ◽

XIN WU ◽

RENGUO SONG ◽

JIYANG WANG

Keyword(s):

Thin Films ◽

Refractive Index ◽

Pulsed Laser Deposition ◽

Silica Glass ◽

Pulsed Laser ◽

Laser Deposition ◽

Propagation Mode ◽

Glass Substrates ◽

Oriented Polycrystalline ◽

Waveguide Fabrication

High-quality Nd:LuVO 4 thin films have been grown on silica glass substrates by using a pulsed laser deposition technique. X-ray diffraction results show that the as-deposited Nd:LuVO 4 film is basically oriented polycrystalline, and strong (200) peak was revealed. The waveguide property was characterized by the prism-coupling method. The refractive index of the propagation mode is higher than that of the silica glass substrate which means that the dips correspond to real propagation mode, where the light could be well defined. The surface morphology of the deposited Nd:LuVO 4 films was also observed by using an atomic force microscopy.

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