Spatially varied orientation selective epitaxial growth of CeO2(100) and (110) regions on Si(100) substrates by reactive magnetron sputtering utilizing electron beam irradiation
1993 ◽
Vol 32
(Part 1, No. 6A)
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pp. 2582-2586
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1996 ◽
Vol 227
(1-4)
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pp. 326-329
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2006 ◽
Vol 289
(2)
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pp. 534-539
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Keyword(s):
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2011 ◽
Vol 14
(4)
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pp. 427-431
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2001 ◽
Vol 80-81
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pp. 65-70
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1995 ◽
Vol 34
(Part 2, No. 3B)
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pp. L339-L341
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