gaas films
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2021 ◽  
pp. 161469
Author(s):  
G. García-Salgado ◽  
J.J. Cruz-Bueno ◽  
F.S. Ramírez-González ◽  
E. Gastellou ◽  
F.G. Nieto-Caballero ◽  
...  
Keyword(s):  

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
T. Nishida ◽  
K. Igura ◽  
T. Imajo ◽  
T. Suemasu ◽  
K. Toko

AbstractThe strong correlation between grain size and photoresponsivity in polycrystalline GaAs films on glass was experimentally demonstrated using Ge seed layers with a wide range of grain sizes (1‒330 μm). The crystal evaluations using Raman spectroscopy, scanning electron microscopy, electron backscatter diffraction, and transmission electron microscopy revealed that 500-nm-thick GaAs films epitaxially grown from the Ge seed layers at 550 °C inherited the grain boundaries and crystal orientations in Ge. With increasing grain size, the photoresponsivity corresponding to GaAs increased from 0.01 to 3 A W−1 under a bias voltage of 0.3 V. The maximum value approached that of the GaAs film formed simultaneously on a single-crystal Ge wafer, indicating the high potential of the large-grained GaAs film. Knowledge gained from this study will be essential for designing advanced solar cells based on polycrystalline III–V compound semiconductors using inexpensive substrates.


Author(s):  
Karl Cedric Gonzales ◽  
Elizabeth Ann Prieto ◽  
Gerald Angelo Catindig ◽  
Alexander De Los Reyes ◽  
Maria Angela Faustino ◽  
...  

2020 ◽  
Author(s):  
Xiejia

The short research of optimization of the growth method to obtain p-type GaAs (001) layers using Si as the dopant was reported in this work. Atomic force microscopy was used to analyze the surface morphology and low-temperature photoluminescence also used to confirm the p-type of the layers.


2020 ◽  
Author(s):  
Dong Fong

The short research of optimization of the growth method to obtain p-type GaAs (001) layers using Si as the dopant was reported in this work. Atomic force microscopy was used to analyze the surface morphology and low-temperature photoluminescence also used to confirm the p-type of the layers.


2020 ◽  
Vol 101 (24) ◽  
Author(s):  
D. M. Photiadis ◽  
M. K. Zalalutdinov ◽  
A. S. Bracker ◽  
S. G. Carter ◽  
D. Gammon ◽  
...  

2020 ◽  
Author(s):  
Sang Zhen

The short research of optimization of the growth method to obtain p-type GaAs (001) layers using Si as the dopant was reported in this work. Atomic force microscopy was used to analyze the surface morphology and low-temperature photoluminescence also used to confirm the p-type of the layers.


APL Materials ◽  
2019 ◽  
Vol 7 (3) ◽  
pp. 031104 ◽  
Author(s):  
S. Singh ◽  
P. Dutta ◽  
M. Rathi ◽  
Y. Yao ◽  
Y. Gao ◽  
...  

2019 ◽  
Vol 34 (3) ◽  
pp. 035031 ◽  
Author(s):  
Jessica Afalla ◽  
Karl Cedric Gonzales ◽  
Elizabeth Ann Prieto ◽  
Gerald Catindig ◽  
John Daniel Vasquez ◽  
...  

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