Linewidth related resistivities and growth behavior of nickel silicide nanowires by solid state reaction between Ni and electron-beam lithography prepared Si nanowires

2021 ◽  
pp. 138612
Author(s):  
Gangqiang Shu ◽  
Chunfeng Hu ◽  
Tong Teng ◽  
Xin-Ping Qu
ChemInform ◽  
2015 ◽  
Vol 46 (24) ◽  
pp. no-no
Author(s):  
Wei Tang ◽  
Binh-Minh Nguyen ◽  
Renjie Chen ◽  
Shadi A. Dayeh

1987 ◽  
Vol 26 (Part 1, No. 9) ◽  
pp. 1513-1518 ◽  
Author(s):  
Toru Murashita ◽  
Akinori Shibayama ◽  
Minpei Fujinami

ChemInform ◽  
2010 ◽  
Vol 30 (6) ◽  
pp. no-no
Author(s):  
Fred Goesmann ◽  
Roland Wenzel ◽  
Rainer Schmid-Fetzer

2000 ◽  
Vol 636 ◽  
Author(s):  
Y. Ito ◽  
A. L. Bleloch ◽  
L. M. Brown

AbstractWe demonstrate the focusing action of a compact solid state pixelated Fresnel phase (PFP) lens for electrons (700 nm in diameter), consisting of an array of holes (“pixelated”) directly drilled by a finely focused electron beam in a thin AlF3 thin film on carbon supporting film. The depths of holes, hence the phase of the exit electron wave is varied as a function of radius from the center of the pattern so that the wavelet from each hole can be in phase on axis at a designated focal point thus producing a lens. An array of two types of lenses, convergent and divergent, with nominal focal length of 1 mm for 200 keV electrons was produced. The estimated full-width-half-maximum of the focus is 8 nm. With improvement of the efficiency, these lenses may find applications in parallel electron-beam lithography, in X-ray optics and in light optics.


2016 ◽  
Vol 157 ◽  
pp. 52-59 ◽  
Author(s):  
Antony Premkumar Peter ◽  
Hao Yu ◽  
Shibesh Dutta ◽  
Erik Rosseel ◽  
Sven Van Elshocht ◽  
...  

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