The optical emission spectroscopy study of an rf-plasma-enhanced magnetron sputtering system

Vacuum ◽  
2006 ◽  
Vol 81 (3) ◽  
pp. 221-225 ◽  
Author(s):  
F. Liu ◽  
C.S. Ren ◽  
Y.N. Wang ◽  
X.L. Qi ◽  
T.C. Ma
Keyword(s):  
Magnetron Sputtering ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Rf Plasma ◽  
Spectroscopy Study ◽  
Sputtering System

CHARACTERISTICS OF TiNi THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING SYSTEM WITH OPTICAL EMISSION SPECTROSCOPY MONITOR

2015 ◽  
Vol 22 (05) ◽  
pp. 1550063
Author(s):  
ERQIANG LIU ◽  
MINGDONG BAO ◽  
GUOZHENG YUAN ◽  
GESHENG XIAO ◽  
TAO JIN ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Parent Phase ◽  
Optical Emission ◽  
Closed Field ◽  
X Ray Diffraction ◽  
Unbalanced Magnetron ◽  
Sputtering System

TiNi composite thin films were fabricated using a closed-field unbalanced magnetron sputtering system equipped with optical emission spectroscopy monitor (OEM). The thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), and nanoindentation. Results show that the TiNi films are amorphous, and their composition varies approximately linearly with the OEM value. Thus, the film composition could be controlled by in situ real-time OEM. The structure of the single B2 parent phase was observed in the annealed TiNi film. The hardness and elastic modulus of the films increased because of the precipitation of the Ti 3 Ni 4 phase in the single B2 parent phase.

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