Optical Emission Spectroscopy Study and 3-D Surface Characterization of Silicone Rubber Exposed to Different Argon RF Plasma Powers

2012 ◽  
Vol 26 (10-11) ◽  
pp. 1313-1323
Author(s):  
Vandana Chauhan ◽  
Sudarshan Neogi ◽  
Ajit Varma ◽  
Sujoy K. Guha
2006 ◽  
Vol 514-516 ◽  
pp. 1274-1278
Author(s):  
Marcia Silva ◽  
Paulo R. Gordo ◽  
Manuel J.P. Maneira ◽  
Francisco Manuel Braz Fernandes

Ni-Ti thin films where the R-phase transformation occurs between 55°C and 30°C, the peak temperature being 40°C, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 – 4 Torr, without polarization and with – 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented.


2021 ◽  
Vol 54 (27) ◽  
pp. 275203
Author(s):  
M Nikolić ◽  
I Sepulveda ◽  
C Gonzalez ◽  
N Khogeer ◽  
M Fernandez-Monteith

2020 ◽  
Vol 370 ◽  
pp. 111278 ◽  
Author(s):  
Sébastien Rassou ◽  
Alain Piquemal ◽  
Nofel Merbahi ◽  
Fréderic Marchal ◽  
Mohammed Yousfi

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