Reactive DC sputter-deposited tantalum oxide thin film for all-solid-state switchable mirror

Vacuum ◽  
2008 ◽  
Vol 83 (3) ◽  
pp. 602-605 ◽  
Author(s):  
Kazuki Tajima ◽  
Yasusei Yamada ◽  
Shanhu Bao ◽  
Masahisa Okada ◽  
Kazuki Yoshimura
Keyword(s):  
Thin Film ◽  
Solid State ◽  
Tantalum Oxide ◽  
Oxide Thin Film ◽  
Switchable Mirror ◽  
Sputter Deposited

Tantalum Oxide Thin Film Prepared by Reactive Sputtering Using Hydrogen-Containing Gas for Electrochromic Switchable Mirror

2010 ◽  
Vol 157 (3) ◽  
pp. J92 ◽  
Author(s):  
Kazuki Tajima ◽  
Yasusei Yamada ◽  
Shanhu Bao ◽  
Masahisa Okada ◽  
Kazuki Yoshimura
Keyword(s):  
Thin Film ◽  
Tantalum Oxide ◽  
Reactive Sputtering ◽  
Oxide Thin Film ◽  
Switchable Mirror

Aluminum buffer layer for high durability of all-solid-state switchable mirror based on magnesium-nickel thin film

2007 ◽  
Vol 91 (5) ◽  
pp. 051908 ◽  
Author(s):  
Kazuki Tajima ◽  
Yasusei Yamada ◽  
Shanhu Bao ◽  
Masahisa Okada ◽  
Kazuki Yoshimura
Keyword(s):  
Thin Film ◽  
Solid State ◽  
Buffer Layer ◽  
High Durability ◽  
Switchable Mirror

Characteristics of optical band gap of tantalum oxide thin film deposited by ion beam sputtering

2017 ◽  
Vol 25 (1) ◽  
pp. 21-27
Author(s):  
刘华松 LIU Hua-song ◽  
杨 霄 YANG Xiao ◽  
王利栓 WANG Li-shuan ◽  
姜玉刚 JIANG Yu-gang ◽  
季一勤 JI Yi-qin ◽  
...  
Keyword(s):  
Thin Film ◽  
Band Gap ◽  
Optical Band Gap ◽  
Ion Beam ◽  
Tantalum Oxide ◽  
Oxide Thin Film ◽  
Ion Beam Sputtering ◽  
Beam Sputtering
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