Formation mechanism, microstructural features and dry-sliding behaviour of “Bronze/WC carbide” composite synthesised by atmospheric pulsed-plasma deposition

Vacuum ◽  
2020 ◽  
pp. 110031
Author(s):  
V.G. Efremenko ◽  
Yu.G. Chabak ◽  
V.I. Fedun ◽  
K. Shimizu ◽  
T.V. Pastukhova ◽  
...  
Keyword(s):  
Formation Mechanism ◽  
Plasma Deposition ◽  
Dry Sliding ◽  
Pulsed Plasma ◽  
Carbide Composite ◽  
Pulsed Plasma Deposition

Pulsed Plasma Deposition from Vinyltrimethylsilane/Oxygen Mixtures

2009 ◽  
Vol 6 (2) ◽  
pp. 132-138 ◽  
Author(s):  
Adriano Francescangeli ◽  
Fabio Palumbo ◽  
Riccardo d'Agostino ◽  
Christophe Defranoux
Keyword(s):  
Plasma Deposition ◽  
Pulsed Plasma ◽  
Pulsed Plasma Deposition

Tungsten-doped tin oxide thin films prepared by pulsed plasma deposition

2009 ◽  
Vol 60 (5) ◽  
pp. 415-419 ◽  
Author(s):  
Yanwei Huang ◽  
Qun Zhang ◽  
Guifeng Li ◽  
Ming Yang
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Plasma Deposition ◽  
Pulsed Plasma ◽  
Oxide Thin Films ◽  
Pulsed Plasma Deposition

Corrosion protection of titanium by pulsed plasma deposition of palladium

2000 ◽  
Vol 42 (7) ◽  
pp. 1213-1234 ◽  
Author(s):  
S.D. Barson ◽  
P. Skeldon ◽  
G.E. Thompson ◽  
J. Piekoszewski ◽  
A.G. Chmielewski ◽  
...  
Keyword(s):  
Corrosion Protection ◽  
Plasma Deposition ◽  
Pulsed Plasma ◽  
Pulsed Plasma Deposition

A novel industrial thin film deposition technology for sustainable CdTe photovoltaics

2012 ◽  
Vol 1447 ◽  
Author(s):  
P. Nozar ◽  
G. Mittica ◽  
S. Milita ◽  
C. Albonetti ◽  
F. Corticelli ◽  
...  
Keyword(s):  
Thin Film ◽  
Plasma Deposition ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Cubic Phase ◽  
Pulsed Plasma ◽  
Grid Parity ◽  
Type Semiconductor ◽  
Pulsed Plasma Deposition ◽  
Quartz Substrates

ABSTRACTCdTe and CdS are emerging as the most promising materials for thin film photovoltaics in the quest of the achievement of grid parity. The major challenge for the advancement of grid parity is the achievement of high quality at the same time as low fabrication cost. The present paper reports the results of the new deposition technique, Pulsed Plasma Deposition (PPD), for the growth of the CdTe layers on CdS/ZnO/quartz and quartz substrates. The PPD method allows to deposit at low temperature. The optical band gap of deposited layers is 1.50 eV, in perfect accord with the value reported in the literature for the crystalline cubic phase of the CdTe.The films are highly crystalline with a predominant cubic phase, a random orientation of the grains of the film and have an extremely low surface roughness of 4.6±0.7 nm r.m.s.. The low roughness, compared to traditional thermal deposition methods (close space sublimation and vapour transport) permits the reduction of the active absorber and n-type semiconductor layers resulting in a dramatic reduction of material usage and the relative deposition issues like safety, deposition rate and ultimately cost

High-power pulsed plasma deposition of hematite photoanode for PEC water splitting

2014 ◽  
Vol 230 ◽  
pp. 8-14 ◽  
Author(s):  
S. Kment ◽  
Z. Hubicka ◽  
J. Krysa ◽  
J. Olejnicek ◽  
M. Cada ◽  
...  
Keyword(s):  
Water Splitting ◽  
High Power ◽  
Plasma Deposition ◽  
Pulsed Plasma ◽  
Pulsed Plasma Deposition ◽  
Pec Water Splitting

Characterization of Deposited Films and the Electron Beam Generated in the Pulsed Plasma Deposition Gun

2011 ◽  
Vol 50 (8S1) ◽  
pp. 08JD03 ◽  
Author(s):  
Dmitry Yarmolich ◽  
Petr Nozar ◽  
Svetlana Gleizer ◽  
Yakov E. Krasik ◽  
Giuseppe Mittica ◽  
...  
Keyword(s):  
Electron Beam ◽  
Plasma Deposition ◽  
Pulsed Plasma ◽  
Pulsed Plasma Deposition ◽  
Deposited Films
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