WO3 and WO3-x thin films prepared by DC hollow cathode discharge

Vacuum ◽  
2021 ◽  
pp. 110679
Author(s):  
J. Olejníček ◽  
A. Hrubantová ◽  
L. Volfová ◽  
M. Dvořáková ◽  
M. Kohout ◽  
...  
Keyword(s):  
Thin Films ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge

Preparation of YBCO thin films by means of a hollow cathode discharge sputtering device

1991 ◽  
Vol 180 (1-4) ◽  
pp. 85-89 ◽  
Author(s):  
F. Ludwig ◽  
V. Hinkel ◽  
T. Schurig ◽  
J.-P. Müller ◽  
U. Stösslein ◽  
...  
Keyword(s):  
Thin Films ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Ybco Thin Films

Co3O4 thin films prepared by hollow cathode discharge

2019 ◽  
Vol 366 ◽  
pp. 303-310 ◽  
Author(s):  
Jiří Olejníček ◽  
Jiří Šmíd ◽  
Roman Perekrestov ◽  
Petra Kšírová ◽  
Jiří Rathouský ◽  
...  
Keyword(s):  
Thin Films ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge

Properties of Copper nitride thin films deposited using a pulsed hollow cathode discharge

2016 ◽  
Vol 12 (3) ◽  
pp. 4400-4404
Author(s):  
Khaled Hussein Metwaly ◽  
Ali Hassan Saudy ◽  
Farouk Fahmy El-Akshar
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Band Gaps ◽  
X Ray Diffraction ◽  
Copper Nitride ◽  
Sem Image ◽  
Glass Substrates ◽  
Optical Band Gaps

Copper nitride (Cu3N) thin films were deposited on a glass substrates using pulsed hollow cathode discharge (PHCD). The deposition was performed at 4kV charging voltage, and nitrogen gas pressure of 10-2 torr. The structure of the thin films was identified by X-Ray diffraction (XRD) technique. The XRD measurements indicated that the thin films have a nanocrystalline nature and exhibit orientation at (111) phase of Cu3N. The grain size of the nanocrystalline films ranged from 41 nm to 80 nm. The optical band gaps were measured using UV–Vis–NIR spectrophotometer and Touc's equation.  The optical band gaps of the films decreased from 2.55 eV to 2.25 eV by increasing the number of deposition shots from 20 to 80 shots. The surface morphology was studied by scanning electron microscopy (SEM). The SEM image indicates that the film have facetted surface morphology packed particles. 

Comparison of plasma characteristics of high-power pulsed sputtering glow discharge and hollow-cathode discharge

2020 ◽  
Vol 60 (1) ◽  
pp. 015501
Author(s):  
Shoki Abe ◽  
Katsuyuki Takahashi ◽  
Seiji Mukaigawa ◽  
Koichi Takaki ◽  
Ken Yukimura
Keyword(s):  
Glow Discharge ◽  
High Power ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Plasma Characteristics

Effect of aging the hollow cathode by sputtering on the analytical precision of the hollow cathode discharge emission source

1992 ◽  
Vol 64 (17) ◽  
pp. 1831-1835 ◽  
Author(s):  
Jih Lie. Tseng ◽  
Jau Yurn. Kung ◽  
J. C. Williams ◽  
Steven T. Griffin
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Emission Source ◽  
Analytical Precision
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