Fundamental properties of ECR plasma CVD and hydrogen-induced low temperature Si epitaxy
2001 ◽
Vol 395
(1-2)
◽
pp. 225-229
◽
Keyword(s):
1991 ◽
Vol 30
(Part 1, No. 5)
◽
pp. 893-896
◽
Keyword(s):
1999 ◽
Vol 38
(Part 1, No. 4B)
◽
pp. 2415-2418
◽
Keyword(s):
1990 ◽
Vol 29
(Part 2, No. 10)
◽
pp. L1753-L1756
◽
Keyword(s):