Stress measurement and stress relaxation during magnetron sputter deposition of cubic boron nitride thin films

2004 ◽  
Vol 447-448 ◽  
pp. 131-135 ◽  
Author(s):  
B. Abendroth ◽  
R. Gago ◽  
A. Kolitsch ◽  
W. Möller
Keyword(s):  
Thin Films ◽  
Stress Relaxation ◽  
Boron Nitride ◽  
Stress Measurement ◽  
Cubic Boron Nitride ◽  
Sputter Deposition ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

Single‐target magnetron sputter deposition of high‐Tcsuperconducting Bi‐Sr‐Ca‐Cu‐O thin films

1988 ◽  
Vol 64 (10) ◽  
pp. 5259-5261 ◽  
Author(s):  
Neelkanth G. Dhere ◽  
John P. Goral ◽  
Alice R. Mason ◽  
Ramesh G. Dhere ◽  
Ronald H. Ono
Keyword(s):  
Thin Films ◽  
Sputter Deposition ◽  
Single Target ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

Single composite target magnetron sputter deposition of crystalline and amorphous SiC thin films

2018 ◽  
Vol 5 (3) ◽  
pp. 036410 ◽  
Author(s):  
Poreddy Chaitanya Akshara ◽  
Guruswamy Rajaram ◽  
M Ghanashyam Krishna
Keyword(s):  
Thin Films ◽  
Sputter Deposition ◽  
Composite Target ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Amorphous Sic
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