Numerical simulation of the characteristics of the different metallic species falling on the growing film in d.c. magnetron sputtering

1996 ◽  
Vol 286 (1-2) ◽  
pp. 305-316 ◽  
Author(s):  
A Malaurie ◽  
A Bessaudou
Keyword(s):  
Numerical Simulation ◽  
Magnetron Sputtering ◽  
Metallic Species

Numerical simulation of the discharge in d.c. magnetron sputtering

1999 ◽  
pp. 58-62
Author(s):  
Eiji Shidoji ◽  
Nobuhiko Nakano ◽  
Toshiaki Makabe
Keyword(s):  
Numerical Simulation ◽  
Magnetron Sputtering

Numerical simulation of the discharge in d.c. magnetron sputtering

1999 ◽  
Vol 351 (1-2) ◽  
pp. 37-41 ◽  
Author(s):  
Eiji Shidoji ◽  
Nobuhiko Nakano ◽  
Toshiaki Makabe
Keyword(s):  
Numerical Simulation ◽  
Magnetron Sputtering

Numerical simulation of plasma confinement in DC magnetron sputtering under different magnetic fields and anode structures

2014 ◽  
Vol 53 (8) ◽  
pp. 088001 ◽  
Author(s):  
Junichi Kageyama ◽  
Mamoru Yoshimoto ◽  
Akifumi Matsuda ◽  
Yasuhiko Akao ◽  
Eiji Shidoji
Keyword(s):  
Numerical Simulation ◽  
Magnetic Fields ◽  
Magnetron Sputtering ◽  
Plasma Confinement ◽  
Dc Magnetron Sputtering

scholarly journals Magnetron sputtered TiO2 with metal NPs for plasmonic applications

2021 ◽  
Vol 2086 (1) ◽  
pp. 012018
Author(s):  
D Konev ◽  
A Kazakin ◽  
A Vorobyev ◽  
Y Enns ◽  
A Kuznetsov ◽  
...  
Keyword(s):  
Numerical Simulation ◽  
Magnetron Sputtering ◽  
Spectral Characteristics ◽  
Reactive Magnetron Sputtering ◽  
Experimental Results ◽  
Optical Parameters ◽  
Tio2 Films ◽  
Reactive Magnetron

Abstract This work is aimed at finding the optimal technological modes for the deposition of TiO2 films by reactive magnetron sputtering for use as a photoactive material in plasmonic applications. The structural and optical parameters of films obtained at different ratios of oxygen in a mixture of working gases were studied. On the basis of the obtained experimental results, a numerical simulation of the spectral characteristics of the TiO2 / NP structure of the metals silver and gold was carried out.

Numerical Simulation of Film Thickness Uniformity Deposited by Planar Circular Magnetron Sputtering System

2014 ◽  
Vol 887-888 ◽  
pp. 743-748 ◽  
Author(s):  
Qing Xiao Zhou ◽  
Chao Yang Wang ◽  
Zhi Bing Fu ◽  
Yong Jian Tang
Keyword(s):  
Numerical Simulation ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Target Distance ◽  
Thickness Uniformity ◽  
Film Distribution ◽  
Geometry Configuration ◽  
Simulation Results ◽  
Sputtering System

There exist angular offset and eccentricity between target and substrate in most practical multi-target magnetron sputtering systems, which should be seriously considered when we calculate the film distribution. This simulation results suggested that excellent thickness uniformity can be obtained when increased the substrate-target distance, angular offset, and eccentricity, but decreased the film thickness simultaneously. However, superior uniformity films without reducing the thickness remarkably can also obtained when the geometry configuration are proper configured.

Water uptake by substituted amylose tablets: experimentation and numerical simulation

2009 ◽  
Vol 00 (00) ◽  
pp. 090904073309027-8
Author(s):  
H.W. Wang ◽  
S. Kyriacos ◽  
L. Cartilier
Keyword(s):  
Numerical Simulation ◽  
Water Uptake
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