scholarly journals Magnetron sputtered TiO2 with metal NPs for plasmonic applications

2021 ◽  
Vol 2086 (1) ◽  
pp. 012018
Author(s):  
D Konev ◽  
A Kazakin ◽  
A Vorobyev ◽  
Y Enns ◽  
A Kuznetsov ◽  
...  
Keyword(s):  
Numerical Simulation ◽  
Magnetron Sputtering ◽  
Spectral Characteristics ◽  
Reactive Magnetron Sputtering ◽  
Experimental Results ◽  
Optical Parameters ◽  
Tio2 Films ◽  
Reactive Magnetron

Abstract This work is aimed at finding the optimal technological modes for the deposition of TiO2 films by reactive magnetron sputtering for use as a photoactive material in plasmonic applications. The structural and optical parameters of films obtained at different ratios of oxygen in a mixture of working gases were studied. On the basis of the obtained experimental results, a numerical simulation of the spectral characteristics of the TiO2 / NP structure of the metals silver and gold was carried out.

scholarly journals INVESTIGATIONS OF TiO2 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING

2001 ◽  
Vol 50 (7) ◽  
pp. 1390
Author(s):  
ZHAO KUN ◽  
ZHU FENG ◽  
WANG LI-FANG ◽  
MENG TIE-JUN ◽  
ZHANG BAO-CHENG ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Tio2 Films ◽  
Reactive Magnetron

Structure and optical parameters of Eu doped tellurium oxide thin films prepared by reactive magnetron sputtering method

2019 ◽  
Vol 691 ◽  
pp. 137592 ◽  
Author(s):  
Marcin Łapiński ◽  
Michalina Walas ◽  
Anna Gapska ◽  
Dorota Kulik ◽  
Aneta Szmytke ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Optical Parameters ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Tellurium Oxide

Photocatalytic Zn-doped TiO2 films prepared by DC reactive magnetron sputtering

Vacuum ◽  
2007 ◽  
Vol 82 (3) ◽  
pp. 328-335 ◽  
Author(s):  
Wenjie Zhang ◽  
Shenglong Zhu ◽  
Ying Li ◽  
Fuhui Wang
Keyword(s):  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Doped Tio2 ◽  
Dc Reactive Magnetron Sputtering

A Study on the Preparation of TiO2-xNx Films by Reactive Deposition and Their Absorption Properties in Visible Region

2005 ◽  
Vol 475-479 ◽  
pp. 1223-1226 ◽  
Author(s):  
Ming Zhao ◽  
Da Ming Zhuang ◽  
Gong Zhang ◽  
Ling Fang ◽  
Min Sheng Wu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Absorption Edge ◽  
Visible Region ◽  
Reactive Magnetron Sputtering ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Doped Tio2 ◽  
Nitrogen Doped

The nitrogen-doped TiO2 thin films were prepared by mid-frequency alternative reactive magnetron sputtering technique. The N concentration of the nitrogen-doped TiO2 thin films was analyzed by XPS. And the absorption spectra of the films in ultraviolet and visible region were also investigated. The results show that the mid-frequency alternative reactive magnetron sputtering technique is a convenient method for growing TiO2-xNx. Annealing the nitrogen-doped TiO2 thin film in nitrogen atmosphere under 380°C is helpful for increase the concentration of nitrogen in the film, but the ratio of N2 in reactive gas is mainly influence the concentration of nitrogen in the Ti-N bond in the TiO2 film. The increase of the thickness of nitrogen-doped TiO2 films will enhance the absorbability of the film in the ultraviolet and visible region. The wavelength of the absorption edge of TiO2-xNx film with 1.5% nitrogen shift to 441nm from 387nm, which is the absorption edge for undoped TiO2 films.

Yttrium-doped TiO2 films prepared by means of DC reactive magnetron sputtering

2009 ◽  
Vol 155 (1-2) ◽  
pp. 83-87 ◽  
Author(s):  
Wenjie Zhang ◽  
Kuanling Wang ◽  
Shenglong Zhu ◽  
Ying Li ◽  
Fuhui Wang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Doped Tio2 ◽  
Dc Reactive Magnetron Sputtering
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