Numerical simulation of plasma confinement in DC magnetron sputtering under different magnetic fields and anode structures

2014 ◽  
Vol 53 (8) ◽  
pp. 088001 ◽  
Author(s):  
Junichi Kageyama ◽  
Mamoru Yoshimoto ◽  
Akifumi Matsuda ◽  
Yasuhiko Akao ◽  
Eiji Shidoji
Keyword(s):  
Numerical Simulation ◽  
Magnetic Fields ◽  
Magnetron Sputtering ◽  
Plasma Confinement ◽  
Dc Magnetron Sputtering

Effect of Film Thicknesses of TbFe and SmFe on Magnetostrictions for Micro-Wireless Actuators

2006 ◽  
Vol 326-328 ◽  
pp. 285-288
Author(s):  
Heung Shik Lee ◽  
Chong Du Cho ◽  
Usik Lee
Keyword(s):  
Finite Element ◽  
Magnetic Fields ◽  
Magnetron Sputtering ◽  
Mechanical Characteristics ◽  
Binary Compound ◽  
Fabrication Process ◽  
Finite Element Models ◽  
Silicon Membrane ◽  
Dc Magnetron Sputtering ◽  
Silicon Based

Silicon based magnetostrictive structures were fabricated for micro-wireless actuators, and finite element models were developed to predict mechanical characteristics of the actuated structures. These structures can be used to design wireless micro-vehicles and multi-function packaged micro-devices. In the fabrication process, amorphous magnetostrictive films of the optimized binary compound Tb0.4Fe0.6 and Sm0.47Fe0.53 were deposited with various thicknesses on the silicon membrane by DC magnetron sputtering using cast composite targets. Magnetic fields lower than 2KOe were applied for micro-system applications. These films have been tested in a simple cantilever arrangement and the predicted magnetostrictions of the actuated membranes through the developed FE models have been calculated.

Effect of Sputtering Pressure on Al-doped ZnO Films by DC Magnetron Sputtering

2013 ◽  
Vol 27 (10) ◽  
pp. 1112-1116 ◽  
Author(s):  
Ke-Wei SUN ◽  
Wan-Cheng ZHOU ◽  
Shan-Shan HUANG ◽  
Xiu-Feng TANG
Keyword(s):  
Magnetron Sputtering ◽  
Zno Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno ◽  
Sputtering Pressure

Structure and Optical Properties CdS and CdTe Films on Flexible Substrate Obtained by DC Magnetron Sputtering for Solar Cells

2017 ◽  
Vol 9 (5) ◽  
pp. 05035-1-05035-6 ◽  
Author(s):  
G. I. Kopach ◽  
◽  
R. P. Mygushchenko ◽  
G. S. Khrypunov ◽  
A. I. Dobrozhan ◽  
...  
Keyword(s):  
Optical Properties ◽  
Solar Cells ◽  
Magnetron Sputtering ◽  
Flexible Substrate ◽  
Dc Magnetron Sputtering ◽  
Cdte Films

Preparing transparent cobalt-doped ZnO thin films by DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6311-6316 ◽  
Author(s):  
Pongladda Panyajirawut ◽  
Nattha Pratumsuwan ◽  
Kornkamon Meesombad ◽  
Kridsana Thanawattana ◽  
Artit Chingsungnoen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno

scholarly journals Black TiOx Films with Photothermal-Assisted Photocatalytic Activity Prepared by Reactive Sputtering

Materials ◽  
2021 ◽  
Vol 14 (10) ◽  
pp. 2508
Author(s):  
Quan Mao ◽  
Meng Liu ◽  
Yajie Li ◽  
Yuquan Wei ◽  
Yong Yang ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Magnetron Sputtering ◽  
High Light ◽  
Chemical Compositions ◽  
Practical Application ◽  
Dc Magnetron Sputtering ◽  
Optical Absorbance ◽  
Low Efficiency ◽  
Tio2 Phase ◽  
Photocatalytic Tio2

Titanium oxide is widely applied as a photocatalyst. However, its low efficiency and narrow light absorption range are two main disadvantages that severely impede its practical application. In this work, black TiOx films with different chemical compositions were fabricated by tuning target voltage and controlling O2 flow during reactive DC magnetron sputtering. The optimized TiOx films with mixed phases (TiO, Ti2O3, Ti3O5, and TiO2) exhibited fantastic photothermal and photocatalytic activity by combining high light-absorptive Ti2O3 and Ti3O5 phases with the photocatalytic TiO2 phase. The sample prepared with oxygen flow at 5.6 ± 0.2 sccm and target voltage near 400 V exhibited excellent optical absorbance of 89.29% under visible light, which could improve surface temperature to 114 °C under sunlight. This film could degrade Rhodamine-B up to 74% after 150 min of UV irradiation. In a word, this work provides a guideline for fabricating black TiOx films with photothermal-assisted photocatalytic activity by reactive DC magnetron sputtering, which could avoid the usage of hydrogen and is convenient for quantity preparation.

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Fabrication and properties evaluation of novel Fe46-XCr23Mo14Co7PXB5Si5 (X=0, 6) m metallic glasses deposited by DC magnetron sputtering

2021 ◽  
Vol 131 ◽  
pp. 107120
Author(s):  
Ali Obeydavi ◽  
Ali Shafyei ◽  
Ahmad Rezaeian ◽  
Parviz Kameli ◽  
Jyh-Wei Lee
Keyword(s):  
Magnetron Sputtering ◽  
Metallic Glasses ◽  
Dc Magnetron Sputtering

scholarly journals Surface enhanced fluorescence of Ag nanostructure films prepared by DC magnetron sputtering

2020 ◽  
Author(s):  
V. Atimayulerd ◽  
N. Srisuai ◽  
S. Boonruang ◽  
S. Kalasung ◽  
C. Chananonnawathorn ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Enhanced Fluorescence ◽  
Surface Enhanced Fluorescence ◽  
Surface Enhanced
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