Formation of high-quality silicon dioxide films by electron cyclotron resonance plasma oxidation and plasma-enhanced chemical vapour deposition
1997 ◽
Vol 36
(1-4)
◽
pp. 53-60
◽
2001 ◽
Vol 383
(1-2)
◽
pp. 172-177
◽
2008 ◽
Vol 114
◽
pp. 012045
◽
1998 ◽
Vol 98
(1-3)
◽
pp. 1503-1509
◽
1998 ◽
Vol 226
(1-2)
◽
pp. 58-66
◽
1994 ◽
Vol 5
(6)
◽
pp. 324-328
◽
1997 ◽
Vol 15
(4)
◽
pp. 1951-1954
◽