C–V and G–V characterization of defects in ultrathin SiO2 thermally grown on RF plasma-hydrogenated silicon

2001 ◽  
Vol 308-310 ◽  
pp. 485-488 ◽  
Author(s):  
S. Alexandrova ◽  
A. Szekeres ◽  
E. Halova
Keyword(s):  
Rf Plasma ◽  
Hydrogenated Silicon ◽  
Thermally Grown

Oxide and interface charges in thin SiO2 films thermally grown on RF plasma hydrogenated silicon

Vacuum ◽  
2004 ◽  
Vol 75 (4) ◽  
pp. 301-305 ◽  
Author(s):  
S Alexandrova ◽  
A Szekeres ◽  
E Halova ◽  
I Lisovskyy ◽  
V Litovchenko ◽  
...  
Keyword(s):  
Rf Plasma ◽  
Hydrogenated Silicon ◽  
Sio2 Films ◽  
Interface Charges ◽  
Thermally Grown

Advanced modeling for optical characterization of amorphous hydrogenated silicon films

2013 ◽  
Vol 541 ◽  
pp. 12-16 ◽  
Author(s):  
Daniel Franta ◽  
David Nečas ◽  
Lenka Zajíčková ◽  
Ivan Ohlídal ◽  
Jiří Stuchlík
Keyword(s):  
Optical Characterization ◽  
Silicon Films ◽  
Hydrogenated Silicon ◽  
Amorphous Hydrogenated Silicon

Characterization of a-SiC:H Films Deposited by RF Plasma CVD

2002 ◽  
Vol 37 (2-3) ◽  
pp. 219-224 ◽  
Author(s):  
Y.T. Kim ◽  
B. Hong ◽  
G.E. Jang ◽  
S.J. Suh ◽  
D.H. Yoon
Keyword(s):  
Rf Plasma ◽  
Plasma Cvd

scholarly journals Fabrication and Characterization of Thermoresponsive Films Deposited by an RF Plasma Reactor

2010 ◽  
Vol 7 (12) ◽  
pp. 992-1000 ◽  
Author(s):  
Adrianne E. Lucero ◽  
Jamie A. Reed ◽  
Xiaomei Wu ◽  
Heather E. Canavan
Keyword(s):  
Plasma Reactor ◽  
Rf Plasma ◽  
Fabrication And Characterization
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