interface charges
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2021 ◽  
Author(s):  
Hongming Ma ◽  
Wenyuan Zhang ◽  
Yan Wang

Abstract A 10kV-level silicon carbide (SiC) insulated gate bipolar transistor (IGBT) with field limiting rings (FLRs) is designed and simulated with Sentaurus TCAD, the detailed optimization method and comparisons are presented in this paper. Linearly varying spacing between rings is introduced to SiC IGBT and adjustment is performed on width of rings, the final structure achieves a breakdown voltage over 12kV with a termination length of 164.5 µm , which is 69.93% lower than that of conventional structure with a fixed ring spacing. Moreover, the final design can decrease the sensitivity to the interface charges, the tolerance to positive surface charges exceeds 8 × 10 11 cm − 2 , which is 3.5 times that of the conventional structure. Besides, double pulse measurements prove no degradation of conduction and switching characteristics.


2021 ◽  
Vol 104 (15) ◽  
Author(s):  
Sebastian Miles ◽  
Dante M. Kennes ◽  
Herbert Schoeller ◽  
Mikhail Pletyukhov

2021 ◽  
Vol 28 (5) ◽  
pp. 1579-1587
Author(s):  
Chuanhui Cheng ◽  
Mingli Fu ◽  
Kai Wu ◽  
Yuntong Ma ◽  
Yanpeng Hao ◽  
...  

2021 ◽  
Vol 104 (12) ◽  
Author(s):  
Niclas Müller ◽  
Kiryl Piasotski ◽  
Dante M. Kennes ◽  
Herbert Schoeller ◽  
Mikhail Pletyukhov

2021 ◽  
Vol 130 (10) ◽  
pp. 105704
Author(s):  
Bledion Rrustemi ◽  
Marie-Anne Jaud ◽  
François Triozon ◽  
Clémentine Piotrowicz ◽  
William Vandendaele ◽  
...  

Author(s):  
R. Fontanini ◽  
J. Barbot ◽  
M. Segatto ◽  
S. Lancaster ◽  
Q. Duong ◽  
...  

Author(s):  
Wilhelmus J. H. Berghuis ◽  
Jimmy Melskens ◽  
Bart Macco ◽  
Roel J. Theeuwes ◽  
Marcel A. Verheijen ◽  
...  

AbstractSurfaces of semiconductors are notorious for the presence of electronic defects such that passivation approaches are required for optimal performance of (opto)electronic devices. For Ge, thin films of Al2O3 prepared by atomic layer deposition (ALD) can induce surface passivation; however, no extensive study on the effect of the Al2O3 process parameters has been reported. In this work we have investigated the influence of the Al2O3 thickness (1–44 nm), substrate temperature (50–350 °C), and post-deposition anneal (in N2, up to 600 °C). We demonstrated that an effective surface recombination velocity as low as 170 cm s−1 can be achieved. The role of the GeOx interlayer as well as the presence of interface charges was addressed and a fixed charge density $${Q}_{\mathrm{f}}=$$ Q f = −(1.8 ± 0.5) × 1012 cm−2 has been found. The similarities and differences between the passivation of Ge and Si surfaces by ALD Al2O3 prepared under the same conditions are discussed. Graphic Abstract


2020 ◽  
Vol 2020 (10) ◽  
Author(s):  
Christopher P. Herzog ◽  
Kuo-Wei Huang ◽  
Dmitri V. Vassilevich

Abstract We consider two d ≥ 2 conformal field theories (CFTs) glued together along a codimension one conformal interface. The conformal anomaly of such a system contains both bulk and interface contributions. In a curved-space setup, we compute the heat kernel coefficients and interface central charges in free theories. The results are consistent with the known boundary CFT data via the folding trick. In d = 4, two interface invariants generally allowed as anomalies turn out to have vanishing interface charges. These missing invariants are constructed from components with odd parity with respect to flipping the orientation of the defect. We conjecture that all invariants constructed from components with odd parity may have vanishing coefficient for symmetric interfaces, even in the case of interacting interface CFT.


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