Detection of C2 radicals in low-pressure inductively coupled plasma source for diamond chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00420-9 ◽

2001 ◽

Vol 10 (3-7) ◽

pp. 388-392 ◽

Author(s):

T. Shiomi ◽

H. Nagai ◽

K. Kato ◽

M. Hiramatsu ◽

M. Nawata

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Source ◽

Low Pressure ◽

Inductively Coupled ◽

Diamond Chemical Vapor Deposition

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Diagnostic and analytical study on a low-pressure limit of diamond chemical vapor deposition in inductively coupled CO–CH4–H2 plasmas

Journal of Applied Physics ◽

10.1063/1.1686900 ◽

2004 ◽

Vol 95 (8) ◽

pp. 4463-4470 ◽

Author(s):

Kungen Teii ◽

Masaru Hori ◽

Toshio Goto

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Analytical Study ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Pressure Limit ◽

Diamond Chemical Vapor Deposition

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Growth of vertically aligned carbon nanofibers by low-pressure inductively coupled plasma-enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.1597981 ◽

2003 ◽

Vol 83 (6) ◽

pp. 1207-1209 ◽

Author(s):

J. B. O. Caughman ◽

L. R. Baylor ◽

M. A. Guillorn ◽

V. I. Merkulov ◽

D. H. Lowndes ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanofibers ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Vertically Aligned ◽

Vertically Aligned Carbon Nanofibers

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Characterization of Amorphous Hydrogenated Carbon Formed by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition Using Multiple Low-Inductance Antenna Units

The Journal of Physical Chemistry B ◽

10.1021/jp045412z ◽

2005 ◽

Vol 109 (11) ◽

pp. 4917-4922 ◽

Author(s):

Osamu Tsuda ◽

Masatou Ishihara ◽

Yoshinori Koga ◽

Shuzo Fujiwara ◽

Yuichi Setsuhara ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Amorphous Hydrogenated Carbon

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Low optical loss germanosilicate planar waveguides by low-pressure inductively coupled plasma-enhanced chemical vapor deposition

Chemical Physics Letters ◽

10.1016/s0009-2614(02)01837-7 ◽

2003 ◽

Vol 368 (1-2) ◽

pp. 183-188 ◽

Author(s):

Q.Y Zhang ◽

K Pita ◽

Charles K.F Ho ◽

N.Q Ngo ◽

L.P Zuo ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Optical Loss ◽

Chemical Vapor ◽

Low Pressure ◽

Planar Waveguides ◽

Inductively Coupled

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Growth of Cubic Boron Nitride Films by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.4385 ◽

1994 ◽

Vol 33 (Part 1, No. 7B) ◽

pp. 4385-4388 ◽

Author(s):

Takanori Ichiki ◽

Toyonobu Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Boron Nitride Films

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X-ray reflectometry study of diamond-like carbon films prepared by plasma enhanced chemical vapor deposition in a low pressure inductively coupled plasma

Thin Solid Films ◽

10.1016/j.tsf.2013.04.033 ◽

2013 ◽

Vol 537 ◽

pp. 102-107

Author(s):

F. Salah ◽

B. Harzallah ◽

A. van der Lee ◽

B. Angleraud ◽

T. Begou ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Carbon Films ◽

Diamond Like Carbon ◽

X Ray ◽

Inductively Coupled

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Preparation of cubic boron nitride films by low pressure inductively coupled plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.111001 ◽

1994 ◽

Vol 64 (7) ◽

pp. 851-853 ◽

Author(s):

Takanori Ichiki ◽

Toyonobu Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Boron Nitride Films

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Nanostructures of the turbostratic BN transition layer in cubic BN thin films deposited by low-pressure inductively coupled plasma-enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1471919 ◽

2002 ◽

Vol 91 (10) ◽

pp. 6695 ◽

Author(s):

H. S. Yang ◽

C. Iwamoto ◽

T. Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Transition Layer ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled

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Effect of N2O to C4F8/O2 on Global Warming during Silicon Nitride Plasma Enhanced Chemical Vapor Deposition (PECVD) Chamber Cleaning Using a Remote Inductively Coupled Plasma Source

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.l1495 ◽

2002 ◽

Vol 41 (Part 2, No. 12B) ◽

pp. L1495-L1498 ◽

Author(s):

Ji Hwang Kim ◽

Chang Hyun Oh ◽

Nae Eung Lee ◽

Geun Young Yeom

Keyword(s):

Global Warming ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Source ◽

Inductively Coupled

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Device Relevant Doped Amorphous Silicon Thin Films by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

2018 IEEE 7th World Conference on Photovoltaic Energy Conversion (WCPEC) (A Joint Conference of 45th IEEE PVSC, 28th PVSEC & 34th EU PVSEC) ◽

10.1109/pvsc.2018.8548298 ◽

2018 ◽

Author(s):

Boon Heng TEO ◽

Jin LIU ◽

Jia GE ◽

Delio PEREZ ◽

Edwin CARMONA ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled ◽

Silicon Thin Films

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