Diagnostic and analytical study on a low-pressure limit of diamond chemical vapor deposition in inductively coupled CO–CH4–H2 plasmas

Journal of Applied Physics ◽

10.1063/1.1686900 ◽

2004 ◽

Vol 95 (8) ◽

pp. 4463-4470 ◽

Author(s):

Kungen Teii ◽

Masaru Hori ◽

Toshio Goto

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Analytical Study ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Pressure Limit ◽

Diamond Chemical Vapor Deposition

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Detection of C2 radicals in low-pressure inductively coupled plasma source for diamond chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00420-9 ◽

2001 ◽

Vol 10 (3-7) ◽

pp. 388-392 ◽

Author(s):

T. Shiomi ◽

H. Nagai ◽

K. Kato ◽

M. Hiramatsu ◽

M. Nawata

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Source ◽

Low Pressure ◽

Inductively Coupled ◽

Diamond Chemical Vapor Deposition

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Growth of vertically aligned carbon nanofibers by low-pressure inductively coupled plasma-enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.1597981 ◽

2003 ◽

Vol 83 (6) ◽

pp. 1207-1209 ◽

Author(s):

J. B. O. Caughman ◽

L. R. Baylor ◽

M. A. Guillorn ◽

V. I. Merkulov ◽

D. H. Lowndes ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanofibers ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Vertically Aligned ◽

Vertically Aligned Carbon Nanofibers

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Characterization of Amorphous Hydrogenated Carbon Formed by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition Using Multiple Low-Inductance Antenna Units

The Journal of Physical Chemistry B ◽

10.1021/jp045412z ◽

2005 ◽

Vol 109 (11) ◽

pp. 4917-4922 ◽

Author(s):

Osamu Tsuda ◽

Masatou Ishihara ◽

Yoshinori Koga ◽

Shuzo Fujiwara ◽

Yuichi Setsuhara ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Amorphous Hydrogenated Carbon

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Low optical loss germanosilicate planar waveguides by low-pressure inductively coupled plasma-enhanced chemical vapor deposition

Chemical Physics Letters ◽

10.1016/s0009-2614(02)01837-7 ◽

2003 ◽

Vol 368 (1-2) ◽

pp. 183-188 ◽

Author(s):

Q.Y Zhang ◽

K Pita ◽

Charles K.F Ho ◽

N.Q Ngo ◽

L.P Zuo ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Optical Loss ◽

Chemical Vapor ◽

Low Pressure ◽

Planar Waveguides ◽

Inductively Coupled

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Growth of Cubic Boron Nitride Films by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.4385 ◽

1994 ◽

Vol 33 (Part 1, No. 7B) ◽

pp. 4385-4388 ◽

Author(s):

Takanori Ichiki ◽

Toyonobu Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Boron Nitride Films

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X-ray reflectometry study of diamond-like carbon films prepared by plasma enhanced chemical vapor deposition in a low pressure inductively coupled plasma

Thin Solid Films ◽

10.1016/j.tsf.2013.04.033 ◽

2013 ◽

Vol 537 ◽

pp. 102-107

Author(s):

F. Salah ◽

B. Harzallah ◽

A. van der Lee ◽

B. Angleraud ◽

T. Begou ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Carbon Films ◽

Diamond Like Carbon ◽

X Ray ◽

Inductively Coupled

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Preparation of cubic boron nitride films by low pressure inductively coupled plasma enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.111001 ◽

1994 ◽

Vol 64 (7) ◽

pp. 851-853 ◽

Author(s):

Takanori Ichiki ◽

Toyonobu Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Boron Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Cubic Boron Nitride ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled ◽

Boron Nitride Films

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Nanostructures of the turbostratic BN transition layer in cubic BN thin films deposited by low-pressure inductively coupled plasma-enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1471919 ◽

2002 ◽

Vol 91 (10) ◽

pp. 6695 ◽

Author(s):

H. S. Yang ◽

C. Iwamoto ◽

T. Yoshida

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Transition Layer ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Low Pressure ◽

Inductively Coupled

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Evaluation of corrosion behaviour of tantalum coating obtained by low pressure chemical vapor deposition using electrochemical polarization

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:20020079 ◽

2002 ◽

Vol 12 (4) ◽

pp. 69-74 ◽

Author(s):

A. Levesque ◽

A. Bouteville ◽

H. de Baynast ◽

B. Laveissière

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Corrosion Behaviour ◽

Chemical Vapor ◽

Low Pressure ◽

Electrochemical Polarization ◽

Pressure Chemical

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ANALYSIS OF HEAT AND MASS TRANSFER DURING MULTI-WAFER LOW PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS

Proceeding of International Heat Transfer Conference 11 ◽

10.1615/ihtc11.240 ◽

1998 ◽

Author(s):

K.S. Park ◽

M. Choi

Keyword(s):

Mass Transfer ◽

Chemical Vapor Deposition ◽

Heat And Mass Transfer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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