scholarly journals Laser-induced damage tests based on a marker-based watershed algorithm with gray control

Author(s):  
Yajing Guo ◽  
Shunxing Tang ◽  
Xiuqing Jiang ◽  
Yujie Peng ◽  
Baoqiang Zhu ◽  
...  

Abstract An effective damage test method based on a marker-based watershed algorithm with gray control (MWGC) is proposed to study the properties of damage induced by near-field laser irradiation for large-aperture laser facilities. Damage tests were performed on fused silica samples and information on the size of damage sites was obtained by this new algorithm, which can effectively suppress the issue of over-segmentation of images resulting from non-uniform illumination in dark-field imaging. Experimental analysis and results show that the lateral damage growth on the exit surface is exponential, and the number of damage sites decreases sharply with damage site size in the damage site distribution statistics. The average damage growth coefficients fitted according to the experimental results for Corning-7980 and Heraeus-Suprasil 312 samples at 351 nm are $\def \xmlpi #1{}\def \mathsfbi #1{\boldsymbol {\mathsf {#1}}}\let \le =\leqslant \let \leq =\leqslant \let \ge =\geqslant \let \geq =\geqslant \def \Pr {\mathit {Pr}}\def \Fr {\mathit {Fr}}\def \Rey {\mathit {Re}}1.10 \pm 0.31$ and $0.60 \pm 0.09$ , respectively.

2013 ◽  
Author(s):  
Zhou Fang ◽  
Yuanan Zhao ◽  
Guohang Hu ◽  
Shunli Chen ◽  
Dawei Li ◽  
...  

Catalysts ◽  
2019 ◽  
Vol 10 (1) ◽  
pp. 46 ◽  
Author(s):  
Hung Ji Huang ◽  
Jeffrey Chi-Sheng Wu ◽  
Hai-Pang Chiang ◽  
Yuan-Fong Chou Chau ◽  
Yung-Sheng Lin ◽  
...  

Plasmonic photocatalytic reactions have been substantially developed. However, the mechanism underlying the enhancement of such reactions is confusing in relevant studies. The plasmonic enhancements of photocatalytic reactions are hard to identify by processing chemically or physically. This review discusses the noteworthy experimental setups or designs for reactors that process various energy transformation paths for enhancing plasmonic photocatalytic reactions. Specially designed experimental setups can help characterize near-field optical responses in inducing plasmons and transformation of light energy. Electrochemical measurements, dark-field imaging, spectral measurements, and matched coupling of wavevectors lead to further understanding of the mechanism underlying plasmonic enhancement. The discussions herein can provide valuable ideas for advanced future studies.


2020 ◽  
Vol 59 (31) ◽  
pp. 9643 ◽  
Author(s):  
Matthieu Veinhard ◽  
Odile Bonville ◽  
Stéphane Bouillet ◽  
Roger Courchinoux ◽  
Romain Parreault ◽  
...  

2009 ◽  
Vol 26 (1) ◽  
pp. 017901 ◽  
Author(s):  
Huang Wan-Qing ◽  
Han Wei ◽  
Wang Fang ◽  
Xiang Yong ◽  
Li Fu-Quan ◽  
...  

2010 ◽  
Vol 22 (7) ◽  
pp. 1436-1440
Author(s):  
徐世珍 Xu Shizhen ◽  
蒋晓东 Jiang Xiaodong ◽  
郑万国 Zheng Wanguo ◽  
袁晓东 Yuan Xiaodong ◽  
祖小涛 Zu Xiaotao

Optik ◽  
2021 ◽  
Vol 226 ◽  
pp. 165549
Author(s):  
Xiangxu Chai ◽  
Ping Li ◽  
Junpu Zhao ◽  
Guanzhong Wang ◽  
Deyan Zhu ◽  
...  

Micromachines ◽  
2021 ◽  
Vol 12 (10) ◽  
pp. 1233
Author(s):  
Mingjie Deng ◽  
Ci Song ◽  
Feng Shi ◽  
Wanli Zhang ◽  
Ye Tian ◽  
...  

The magnetorheological (MR) repair method can effectively repair the small-scale damage of fused silica optics and further improve the laser-induced damage threshold of fused silica optics. However, at present, the rules of MR repair of small-scale damage of fused silica are not clear and cannot provide further guidance for the repair process. In this paper, the fused silica damage samples were repaired layer by layer by the MR method. The number and size changes of all the surface damage, the morphology, the fluorescence area distribution, and photothermal-absorption value of a single typical small-scale damage were measured. Through dark field scattering imaging, it is found that when the repair depth is 5 μm, the repair completion rate of damage with a transverse size less than 50 μm can reach 44%, and the repair efficiency decreases gradually with the repair process. Focusing on the whole repair process of a single typical, small-scale damage—due to the flexible shear removal mechanism of the MR method—the repair process of damage can be divided into three stages, which as a whole is a top-down, from outside to inside process. The first stage is the process of removing the surface of the damage layer by layer. In this process, MR fluid will introduce pollution to the inside of the damage. In the second stage, MR fluid begins to repair the inside of the damage. In the third stage, the MR ribbon completely covers the inside of the damage, and the repair effect is the most obvious. The measurement results of photothermal absorption and fluorescence area distribution of damage confirm this process. The photothermal absorption value and fluorescence area distribution of damage do not simply decrease with the repair process. On the contrary, they gradually increase first, and then decrease significantly when the damage depth reaches less than 1 μm. As the thickness of the MR ribbon is 1 μm, the reduction in the photothermal absorption value and fluorescence area of the damage is due to the process of repairing the inside of the damage. The results show that the absorbent impurities inside the small-scale damage of fused silica are the main factor affecting the performance. The key to repairing the small-scale damage of fused silica by the MR method is that the damaged interior must be repaired effectively. This paper outlines the MR repair method of small-scale damage of fused silica, which is of great significance to optimize the MR repair process.


2016 ◽  
Vol 65 (24) ◽  
pp. 246102
Author(s):  
Han Wei ◽  
Feng Bin ◽  
Zheng Kui-Xing ◽  
Zhu Qi-Hua ◽  
Zheng Wan-Guo ◽  
...  

2020 ◽  
Vol 59 (31) ◽  
pp. 9652 ◽  
Author(s):  
Matthieu Veinhard ◽  
Odile Bonville ◽  
Roger Courchinoux ◽  
Romain Parreault ◽  
Jean-Yves Natoli ◽  
...  

Author(s):  
Akira Tanaka ◽  
David F. Harling

In the previous paper, the author reported on a technique for preparing vapor-deposited single crystal films as high resolution standards for electron microscopy. The present paper is intended to describe the preparation of several high resolution standards for dark field microscopy and also to mention some results obtained from these studies. Three preparations were used initially: 1.) Graphitized carbon black, 2.) Epitaxially grown particles of different metals prepared by vapor deposition, and 3.) Particles grown epitaxially on the edge of micro-holes formed in a gold single crystal film.The authors successfully obtained dark field micrographs demonstrating the 3.4Å lattice spacing of graphitized carbon black and the Au single crystal (111) lattice of 2.35Å. The latter spacing is especially suitable for dark field imaging because of its preparation, as in 3.), above. After the deposited film of Au (001) orientation is prepared at 400°C the substrate temperature is raised, resulting in the formation of many square micro-holes caused by partial evaporation of the Au film.


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