Near Edge X-Ray Absorption Fine Structure (NEXAFS) Microscopy: Chemical Analysis at Sub Visible Spatial Resolution

1997 ◽  
Vol 3 (S2) ◽  
pp. 851-852
Author(s):  
H. Ade
Keyword(s):  
Fine Structure ◽  
Compositional Analysis ◽  
High Sensitivity ◽  
Linear Dichroism ◽  
X Rays ◽  
X Ray ◽  
Absorption Fine ◽  
Nexafs Spectroscopy ◽  
Wide Range ◽  
X Ray Absorption

Infrared, Raman, and fluorescence/luminescence microspectroscopy/microscopy in many instances seek to provide high sensitivity compositional and functional information that goes beyond mere elemental composition. This goal is shared by NEXAFS microscopy, in which Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy is employed to provide chemical sensitivity and can be relatively easily adopted in a scanning transmission x-ray microscope (STXM). In addition to compositional information, NEXAFS microscopy can exploit the dependence of x-ray absorption resonances on the bond orientation relative to the linearly polarized x rays (linear dichroism microscopy). For compositional analysis, NEXAFS microscopy is analogous to Electron Energy Loss Spectroscopy (EELS) in an electron microscope. However, when utilizing near edge spectral features, NEXAFS microscopy requires a considerable lower dose than EELS microscopy which makes it very suitable to studying radiation sensitive materials such as polymers. NEXAFS has shown to have excellent sensitivity to a wide range of moieties in polymers, including sensitivity to substitution isomerism.

X–ray absorption fine structure (XAFS) of Si wafer measured using total reflection X–rays

1999 ◽  
Vol 54 (1) ◽  
pp. 215-222 ◽  
Author(s):  
Jun Kawai ◽  
Shinjiro Hayakawa ◽  
Yoshinori Kitajima ◽  
Yohichi Gohshi
Keyword(s):  
Fine Structure ◽  
Total Reflection ◽  
X Rays ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption ◽  
Si Wafer

X-Ray Absorption Fine Structure with Polarized X-Rays

1953 ◽  
Vol 92 (6) ◽  
pp. 1394-1396 ◽  
Author(s):  
R. Krogstad ◽  
W. Nelson ◽  
S. T. Stephenson
Keyword(s):  
Fine Structure ◽  
X Rays ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption

Bent crystal Laue analyser combined with total reflection fluorescence X-ray absorption fine structure (BCLA + TRF-XAFS) and its application to surface studies

2020 ◽  
Vol 27 (6) ◽  
pp. 1618-1625
Author(s):  
Yuki Wakisaka ◽  
Bing Hu ◽  
Daiki Kido ◽  
Md. Harun Al Rashid ◽  
Wenhan Chen ◽  
...  
Keyword(s):  
Fine Structure ◽  
Sudden Change ◽  
Fluorescence Emission ◽  
Total Reflection ◽  
X Rays ◽  
X Ray ◽  
Xafs Spectroscopy ◽  
Bent Crystal ◽  
Absorption Fine ◽  
X Ray Absorption

A bent crystal Laue analyser (BCLA) is an X-ray energy analyser used for fluorescence X-ray absorption fine-structure (XAFS) spectroscopy to separate the fluorescence X-ray emission line of a target atom from the elastic scattering X-rays and other fluorescence emission lines. Here, the feasibility of the BCLA for total reflection fluorescence XAFS (TRF-XAFS), which has a long X-ray footprint on the substrate surface owing to grazing incidence, was tested. The focal line of the BCLA was adjusted on the X-ray footprint and the XAFS signal for one monolayer of Pt deposited on a 60 nm Au film with high sensitivity was obtained. Although range-extended XAFS was expected by the rejection of Au fluorescence arising from the Au substrate, a small glitch was found in the Au L 3 edge because of the sudden change of the complex refraction index of the Au substrate at the Au edge. This abnormal spectrum feature can be removed by reflectivity correction using Au foil absorption data. BCLA combined with TRF-XAFS spectroscopy (BCLA + TRF-XAFS) is a new technique for the in situ surface analysis of highly dispersed systems even in the presence of a liquid overlayer.

Investigating the structure of boron nitride nanotubes by near-edge X-ray absorption fine structure (NEXAFS) spectroscopy

2005 ◽  
Vol 7 (6) ◽  
pp. 1103 ◽  
Author(s):  
Tirandai Hemraj-Benny ◽  
Sarbajit BanerjeeCurrent address: Department ◽  
Sharadha Sambasivan ◽  
Daniel A. Fischer ◽  
Weiqiang Han ◽  
...  
Keyword(s):  
Fine Structure ◽  
Boron Nitride ◽  
Boron Nitride Nanotubes ◽  
X Ray ◽  
Absorption Fine ◽  
Nexafs Spectroscopy ◽  
X Ray Absorption

scholarly journals X-Ray Absorption Spectroscopy from H-Passivated Porous Si and Oxidized Si Nanocrystals

1994 ◽  
Vol 375 ◽  
Author(s):  
S. Schuppler ◽  
S. L. Friedman ◽  
M. A. Marcus ◽  
D. L. Adler ◽  
Y.-H. Xie ◽  
...  
Keyword(s):  
Fine Structure ◽  
Quantum Confinement ◽  
Ir Absorption ◽  
X Ray ◽  
Coordination Numbers ◽  
Absorption Fine ◽  
Visible Luminescence ◽  
Si Nanocrystals ◽  
Wide Range ◽  
X Ray Absorption

AbstractQuantum confinement in nanoscale Si structures is widely believed to be responsible for the visible luminescence observed from anodically etched porous silicon (por-Si), but little is known about the actual size or shape of these structures. Extended x-ray absorption fine structure data from a wide variety of por-Si samples show significantly reduced average Si coordination numbers due to the sizable contribution of surface-coordinated H. (The H/Si ratios, as large as 1.2, were independently confirmed by ir-absorption and α-recoil measurements.) The Si coordinations imply very large surface/volume ratios, enabling the average Si structures to be identified as crystalline particles (not wires) whose dimensions are typically <15 Å. Comparison of the size-dependent peak luminescence energies with those of oxidized Si nanocrystals, whose shapes are known, shows remarkable agreement. Furthermore, near-edge x-ray absorption fine structure measurements of the nanocrystals shows the outer oxide and interfacial suboxide layers to be constant over a wide range of nanocrystal sizes. The combination of these results effectively rules out surface species as being responsible for the observed visible luminescence in por-Si, and strongly supports quantum confinement as the dominant mechanism occurring in Si particles which are substantially smaller than previously reported or proposed.

Electronic Structure of Individual Hybrid Colloid Particles Studied by Near-Edge X-ray Absorption Fine Structure (NEXAFS) Spectroscopy in the X-ray Microscope

Nano Letters ◽  
2013 ◽  
Vol 13 (2) ◽  
pp. 824-828 ◽  
Author(s):  
Katja Henzler ◽  
Peter Guttmann ◽  
Yan Lu ◽  
Frank Polzer ◽  
Gerd Schneider ◽  
...  
Keyword(s):  
Electronic Structure ◽  
Fine Structure ◽  
X Ray ◽  
Absorption Fine ◽  
Nexafs Spectroscopy ◽  
Colloid Particles ◽  
X Ray Absorption

Cyclic dipeptide immobilization on Au(111) and Cu(110) surfaces

2014 ◽  
Vol 16 (14) ◽  
pp. 6657-6665 ◽  
Author(s):  
Oksana Plekan ◽  
Vitaliy Feyer ◽  
Sylwia Ptasińska ◽  
Nataliya Tsud ◽  
Kevin C. Prince
Keyword(s):  
Fine Structure ◽  
Photoelectron Spectroscopy ◽  
Adsorption Properties ◽  
Cyclic Dipeptide ◽  
Cyclic Dipeptides ◽  
X Ray ◽  
Absorption Fine ◽  
Nexafs Spectroscopy ◽  
X Ray Absorption

Soft X-ray Photoelectron Spectroscopy (XPS) and Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy have been used to probe the electronic and adsorption properties of two cyclic dipeptides, i.e. cyclo(glycyl-histidyl) and cyclo(phenylalanyl-prolyl), on Au(111) and Cu(110) surfaces.

Laser-EXAFS: Fast Extended X-ray Absorption Fine Structure Spectroscopy with a Single Pulse of Laser-Produced X-rays

Science ◽  
1979 ◽  
Vol 206 (4416) ◽  
pp. 353-355 ◽  
Author(s):  
P. J. MALLOZZI ◽  
R. E. SCHWERZEL ◽  
H. M. EPSTEIN ◽  
B. E. CAMPBELL
Keyword(s):  
Fine Structure ◽  
Single Pulse ◽  
X Rays ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption
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