scholarly journals Strong Amplified Spontaneous Emission from High Quality GaAs1–xSbx Single Quantum Well Nanowires

2017 ◽  
Vol 121 (15) ◽  
pp. 8636-8644 ◽  
Author(s):  
Xiaoming Yuan ◽  
Dhruv Saxena ◽  
Philippe Caroff ◽  
Fan Wang ◽  
Mark Lockrey ◽  
...  

1997 ◽  
Vol 36 (Part 1, No. 3B) ◽  
pp. 1961-1965 ◽  
Author(s):  
Akihiko Ishibashi ◽  
Hidemi Takeishi ◽  
Nobuyuki Uemura ◽  
Masahiro Kume ◽  
Yasufumi Yabuuchi ◽  
...  


1993 ◽  
Vol 48 (23) ◽  
pp. 17599-17602 ◽  
Author(s):  
O. Brandt ◽  
K. Kanamoto ◽  
Y. Tokuda ◽  
N. Tsukada ◽  
O. Wada ◽  
...  


2010 ◽  
Vol 97 (6) ◽  
pp. 061911 ◽  
Author(s):  
W. F. Yang ◽  
B. Liu ◽  
R. Chen ◽  
L. M. Wong ◽  
S. J. Wang ◽  
...  


1991 ◽  
Vol 115 (1-4) ◽  
pp. 333-337 ◽  
Author(s):  
S. Ramesh ◽  
N. Kobayashi ◽  
Y. Horikoshi


1998 ◽  
Author(s):  
Hongdong Zhao ◽  
Guangdi Shen ◽  
Tao Yin ◽  
Changhua Chen ◽  
ZunTu Xu ◽  
...  


1996 ◽  
Author(s):  
Akihiko ISHIBASHI ◽  
Hidemi TAKEISHI ◽  
Nobuyuki UEMURA ◽  
Masahiro KUME ◽  
Yuzaburoh BAN




1994 ◽  
Author(s):  
E. V. Arjanov ◽  
Olga V. Danilina ◽  
Vadim P. Konyaev ◽  
Alexander S. Logginov ◽  
Vasiliy I. Shveikin ◽  
...  


1996 ◽  
Vol 423 ◽  
Author(s):  
S. P. Denbaars ◽  
S. Keller ◽  
B. P. Keller ◽  
Y. F. Wu ◽  
D. Kapolnek ◽  
...  

AbstractUsing atmospheric pressure MOCVD we have obtained high quality InGaN/GaN and AlGaN/GaN heterostructure materials and devices. For nominally undoped 4 μm thick GaN films, we obtained 300 K mobilities of 780 cm2/Vs and an unintentional background impurity level of n300K = 6*1016 cm−3. For InGaN/GaN heterostructures we have obtained direct band-edge transitions with FWHM as narrow as 7.9 nm (59 meV) for 50Å thick In0.16Ga0.84N quantum wells at 300K, which is the among the best reported values. The quantum wells display energy shifts towards shorter wavelength with decreasing well thickness, and the shift agrees with predicted quantum effects. These materials have been incorporated into InGaN single quantum well LEDs that emit at 450 nm. In addition AlGaN/GaN heterostructure materials have been incorporated into HFETs and MODFETs. Gate-drain breakdown voltage well exceeding 100 V, and extrinsic transconductance gm of up to 140 mS/mm were realized in the MODFET.



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