scholarly journals Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers

2021 ◽  
Author(s):  
Gwenaelle Pound-Lana ◽  
Philippe Bézard ◽  
Camille Petit-Etienne ◽  
Sébastien Cavalaglio ◽  
Gilles Cunge ◽  
...  
Keyword(s):  
Block Copolymers ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Dry Etching

scholarly journals High-aspect-ratio mushroom-like silica nanopillars immersed in air: epsilon-near-zero metamaterials mediated by a phonon-polaritonic anisotropy

RSC Advances ◽  
2019 ◽  
Vol 9 (29) ◽  
pp. 16431-16438
Author(s):  
Kota Ito ◽  
Yuri Yamada ◽  
Atsushi Miura ◽  
Hideo Iizuka
Keyword(s):  
Block Copolymers ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Self Assembly ◽  
Infrared Range ◽  
Mid Infrared ◽  
Zero Response ◽  
Epsilon Near Zero

High-aspect-ratio mushroom-like silica nanopillars fabricated from self-assembly of block-copolymers exhibit a uniaxial epsilon-near-zero response in the mid-infrared range.

High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

2017 ◽  
Vol 180 ◽  
pp. 20-24 ◽  
Author(s):  
Y. Lisunova ◽  
M. Spieser ◽  
R.D.D. Juttin ◽  
F. Holzner ◽  
J. Brugger
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Dry Etching ◽  
Scanning Probe ◽  
Scanning Probe Lithography

Dry Etching of High Aspect Ratio 4H-SiC Microstructures

2017 ◽  
Vol 6 (4) ◽  
pp. P207-P210 ◽  
Author(s):  
Lunet E. Luna ◽  
Marko J. Tadjer ◽  
Travis J. Anderson ◽  
Eugene A. Imhoff ◽  
Karl D. Hobart ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Dry Etching

High-Aspect-Ratio Nanometer-Pattern Fabrication Using Fullerene-Incorporated Nanocomposite Resists for Dry-Etching Application

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7642-7645 ◽  
Author(s):  
Tomohiro Shibata ◽  
Tetsuyoshi Ishii ◽  
Hiroshi Nozawa ◽  
Toshiaki Tamamura
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Dry Etching ◽  
Nanometer Pattern

scholarly journals Fabrication of silicon nanotip arrays with high aspect ratio by cesium chloride self-assembly and dry etching

AIP Advances ◽  
2014 ◽  
Vol 4 (3) ◽  
pp. 031335 ◽  
Author(s):  
Xinshuai Zhang ◽  
Jing Liu ◽  
Bo Wang ◽  
Tianchong Zhang ◽  
Futing Yi
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Self Assembly ◽  
Cesium Chloride ◽  
Dry Etching ◽  
Silicon Nanotip
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