Atomic Layer Deposition of Rhenium–Aluminum Oxide Thin Films and ReOx Incorporation in a Metal–Organic Framework

2017 ◽  
Vol 9 (40) ◽  
pp. 35067-35074 ◽  
Author(s):  
Martino Rimoldi ◽  
Joseph T. Hupp ◽  
Omar K. Farha
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Metal Organic Framework ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
Metal Organic ◽  
Organic Framework

Metal–Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions To Enable Electrocatalytic Water Oxidation

2015 ◽  
Vol 7 (51) ◽  
pp. 28223-28230 ◽  
Author(s):  
Chung-Wei Kung ◽  
Joseph E. Mondloch ◽  
Timothy C. Wang ◽  
Wojciech Bury ◽  
William Hoffeditz ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Water Oxidation ◽  
Metal Organic Framework ◽  
Atomic Layer ◽  
Cobalt Ions ◽  
Layer Deposition ◽  
Metal Organic ◽  
Organic Framework

Copper Benzenetricarboxylate Metal–Organic Framework Nucleation Mechanisms on Metal Oxide Powders and Thin Films formed by Atomic Layer Deposition

2016 ◽  
Vol 8 (14) ◽  
pp. 9514-9522 ◽  
Author(s):  
Paul C. Lemaire ◽  
Junjie Zhao ◽  
Philip S. Williams ◽  
Howard J. Walls ◽  
Sarah D. Shepherd ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Metal Organic Framework ◽  
Atomic Layer ◽  
Oxide Powders ◽  
Layer Deposition ◽  
Nucleation Mechanisms ◽  
Metal Organic ◽  
Organic Framework

Nickel–Carbon–Zirconium Material Derived from Nickel-Oxide Clusters Installed in a Metal–Organic Framework Scaffold by Atomic Layer Deposition

Langmuir ◽  
2018 ◽  
Vol 34 (47) ◽  
pp. 14143-14150 ◽  
Author(s):  
Rebecca H. Palmer ◽  
Chung-Wei Kung ◽  
Jian Liu ◽  
Omar K. Farha ◽  
Joseph T. Hupp
Keyword(s):  
Atomic Layer Deposition ◽  
Nickel Oxide ◽  
Metal Organic Framework ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Metal Organic ◽  
Organic Framework

scholarly journals Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films

2019 ◽  
Vol 37 (4) ◽  
pp. 040901 ◽  
Author(s):  
Fatemeh S. M. Hashemi ◽  
LiAo Cao ◽  
Felix Mattelaer ◽  
Timo Sajavaara ◽  
J. Ruud van Ommen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition

Tuning the properties of metal–organic framework nodes as supports of single-site iridium catalysts: node modification by atomic layer deposition of aluminium

2017 ◽  
Vol 201 ◽  
pp. 195-206 ◽  
Author(s):  
Dong Yang ◽  
Mohammad R. Momeni ◽  
Hakan Demir ◽  
Dale R. Pahls ◽  
Martino Rimoldi ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Density Functional ◽  
Metal Organic Framework ◽  
Density Functional Theory Calculations ◽  
Atomic Layer ◽  
Single Site ◽  
Iridium Complexes ◽  
Layer Deposition ◽  
Metal Organic ◽  
Organic Framework

The metal–organic framework NU-1000, with Zr6-oxo, hydroxo, and aqua nodes, was modified by incorporation of hydroxylated Al(iii) ions by ALD-like chemistry with [Al(CH3)2(iso-propoxide)]2 followed by steam (ALD = atomic layer deposition). Al ions were installed to the extent of approximately 7 per node. Single-site iridium diethylene complexes were anchored to the nodes of the modified and unmodified MOFs by reaction with Ir(C2H4)2(acac) (acac = acetylacetonate) and converted to Ir(CO)2 complexes by treatment with CO. Infrared spectra of these supported complexes show that incorporation of Al weakened the electron donor tendency of the MOF. Correspondingly, the catalytic activity of the initial supported iridium complexes for ethylene hydrogenation increased, as did the selectivity for ethylene dimerization. The results of density functional theory calculations with a simplified model of the nodes incorporating Al(iii) ions are in qualitative agreement with some catalyst performance data.

Vapor-Phase Metalation by Atomic Layer Deposition in a Metal–Organic Framework

2013 ◽  
Vol 135 (28) ◽  
pp. 10294-10297 ◽  
Author(s):  
Joseph E. Mondloch ◽  
Wojciech Bury ◽  
David Fairen-Jimenez ◽  
Stephanie Kwon ◽  
Erica J. DeMarco ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Vapor Phase ◽  
Metal Organic Framework ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Metal Organic ◽  
Organic Framework

scholarly journals Nucleation Effects in the Atomic Layer Deposition of Nickel–Aluminum Oxide Thin Films

2020 ◽  
Vol 32 (5) ◽  
pp. 1925-1936 ◽  
Author(s):  
Jon G. Baker ◽  
Joel R. Schneider ◽  
James A. Raiford ◽  
Camila de Paula ◽  
Stacey F. Bent
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Nickel Aluminum ◽  
Oxide Thin Films ◽  
Layer Deposition

scholarly journals Atomic Layer Deposition in a Metal–Organic Framework: Synthesis, Characterization, and Performance of a Solid Acid

2017 ◽  
Vol 29 (3) ◽  
pp. 1058-1068 ◽  
Author(s):  
Martino Rimoldi ◽  
Varinia Bernales ◽  
Joshua Borycz ◽  
Aleksei Vjunov ◽  
Leighanne C. Gallington ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Solid Acid ◽  
Metal Organic Framework ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Metal Organic ◽  
And Performance ◽  
Organic Framework

High-quality remote plasma enhanced atomic layer deposition of aluminum oxide thin films for nanoelectronics applications

2021 ◽  
pp. 108027
Author(s):  
Robin Khosla ◽  
Daniel Schwarz ◽  
Hannes S. Funk ◽  
Kateryna Guguieva ◽  
Jörg Schulze
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Aluminum Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Remote Plasma ◽  
High Quality ◽  
Layer Deposition
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