Precision Interface Engineering of an Atomic Layer in Bulk Bi2Te3 Alloys for High Thermoelectric Performance

ACS Nano ◽  
2019 ◽  
Vol 13 (6) ◽  
pp. 7146-7154 ◽  
Author(s):  
Kwang-Chon Kim ◽  
Sang-Soon Lim ◽  
Seung Hwan Lee ◽  
Junpyo Hong ◽  
Deok-Yong Cho ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Thermoelectric Performance ◽  
Interface Engineering ◽  
Bi2te3 Alloys

Enhanced thermoelectric properties of atomic-layer-deposited Hf:Zn16O/18O superlattice films by interface-engineering

2020 ◽  
Vol 46 (6) ◽  
pp. 7122-7130
Author(s):  
Bo-Wei Shih ◽  
Wen-Pin Hsieh ◽  
Jing-Jong Shyue ◽  
Feng-Yu Tsai
Keyword(s):  
Thermoelectric Properties ◽  
Atomic Layer ◽  
Interface Engineering

scholarly journals Enhanced Electrical Properties of Atomic Layer Deposited LaxAlyO Thin Films with Stress Relieved Preoxide Pretreatment

Materials ◽  
2018 ◽  
Vol 11 (9) ◽  
pp. 1601
Author(s):  
Xing Wang ◽  
Hongxia Liu ◽  
Lu Zhao ◽  
Yongte Wang
Keyword(s):  
Electrical Properties ◽  
Atomic Layer ◽  
Breakdown Field ◽  
Gate Leakage Current ◽  
Interface Engineering ◽  
Order Of Magnitude ◽  
Mis Capacitor ◽  
The Impact ◽  
Breakdown Field Strength ◽  
Gate Leakage Current Density

The impact of stress relieved preoxide (SRPO) interface engineering on the physical and electrical properties of LaxAlyO films was investigated. It was proved that the SRPO pretreatment has little influence on the surface morphology of LaxAlyO films and the chemical bond composition of LaxAlyO/Si interface. However, the SRPO pretreated MIS capacitor displayed obvious improvement in decreasing the amount of trapped oxide charges and interfacial traps. As a result, a reduction of more than one order of magnitude in the gate leakage current density was obtained. The breakdown field strength and TDDB reliability of the LaxAlyO film treated with SRPO were also enhanced.

Atomic layer deposition-triggered hierarchical core/shell stable bifunctional electrocatalysts for overall water splitting

2021 ◽  
Vol 9 (37) ◽  
pp. 21132-21141
Author(s):  
T. Kavinkumar ◽  
Selvaraj Seenivasan ◽  
Hyeonjung Jung ◽  
Jeong Woo Han ◽  
Do-Heyoung Kim
Keyword(s):  
Surface Modification ◽  
Atomic Layer Deposition ◽  
Water Splitting ◽  
Atomic Layer ◽  
Core Shell ◽  
Interface Engineering ◽  
Bifunctional Electrocatalyst ◽  
Overall Water Splitting ◽  
Bifunctional Electrocatalysts ◽  
Layer Deposition

A synergistic strategy of interface engineering and surface modification is efficient to construct a promising bifunctional electrocatalyst for enhanced electrocatalytic water splitting.

Interface Engineering of Mesoscopic Perovskite Solar Cells by Atomic Layer Deposition of Ta2O5

2021 ◽  
Author(s):  
Rohit D. Chavan ◽  
Mohammad Mahdi Tavakoli ◽  
Suverna Trivedi ◽  
Daniel Prochowicz ◽  
Abul Kalam ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Perovskite Solar Cells ◽  
Atomic Layer ◽  
Interface Engineering ◽  
Layer Deposition

Interface Engineering of CsPbBr 3 Nanocrystal Light‐Emitting Diodes via Atomic Layer Deposition

2020 ◽  
Vol 14 (6) ◽  
pp. 2000083 ◽  
Author(s):  
Binze Zhou ◽  
Zhaojie Wang ◽  
Shicai Geng ◽  
Yun Li ◽  
Kai Wang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Light Emitting Diodes ◽  
Atomic Layer ◽  
Interface Engineering ◽  
Light Emitting ◽  
Layer Deposition

Interface engineering for the passivation of c-Si with O3-based atomic layer deposited AlOx for solar cell application

2012 ◽  
Vol 100 (14) ◽  
pp. 143901 ◽  
Author(s):  
Hyunju Lee ◽  
Tomihisa Tachibana ◽  
Norihiro Ikeno ◽  
Hiroki Hashiguchi ◽  
Koji Arafune ◽  
...  
Keyword(s):  
Solar Cell ◽  
Atomic Layer ◽  
Interface Engineering ◽  
Solar Cell Application

scholarly journals Encapsulation of graphene transistors and vertical device integration by interface engineering with atomic layer deposited oxide

2D Materials ◽  
2016 ◽  
Vol 4 (1) ◽  
pp. 011008 ◽  
Author(s):  
Jack A Alexander-Webber ◽  
Abhay A Sagade ◽  
Adrianus I Aria ◽  
Zenas A Van Veldhoven ◽  
Philipp Braeuninger-Weimer ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Interface Engineering ◽  
Device Integration

Effective atomic interface engineering in Bi2Te2.7Se0.3 thermoelectric material by atomic-layer-deposition approach

Nano Energy ◽  
2018 ◽  
Vol 49 ◽  
pp. 257-266 ◽  
Author(s):  
Shuankui Li ◽  
Yidong Liu ◽  
Fusheng Liu ◽  
Dongsheng He ◽  
Jiaqing He ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Thermoelectric Material ◽  
Atomic Layer ◽  
Interface Engineering ◽  
Layer Deposition ◽  
Atomic Interface

Interface Engineering for Extremely Large Grains in Explosively Crystallized TiO2 Films Grown by Low-Temperature Atomic Layer Deposition

2017 ◽  
Vol 29 (5) ◽  
pp. 2046-2054 ◽  
Author(s):  
Cheol Jin Cho ◽  
Jun-Yun Kang ◽  
Woo Chul Lee ◽  
Seung-Hyub Baek ◽  
Jin-Sang Kim ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Interface Engineering ◽  
Layer Deposition
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