Room-Temperature Observation of Trapped Exciton-Polariton Emission in GaN/AlGaN Microcavities with Air-Gap/III-Nitride Distributed Bragg Reflectors

ACS Photonics ◽  
2016 ◽  
Vol 3 (7) ◽  
pp. 1182-1187 ◽  
Author(s):  
Renchun Tao ◽  
Kenji Kamide ◽  
Munetaka Arita ◽  
Satoshi Kako ◽  
Yasuhiko Arakawa
2015 ◽  
Vol 107 (10) ◽  
pp. 101102 ◽  
Author(s):  
Renchun Tao ◽  
Munetaka Arita ◽  
Satoshi Kako ◽  
Kenji Kamide ◽  
Yasuhiko Arakawa

1997 ◽  
Vol 44 (1-3) ◽  
pp. 364-367 ◽  
Author(s):  
K. Streubel ◽  
S. Rapp ◽  
J. André ◽  
N. Chitica

2010 ◽  
Vol 18 (2) ◽  
Author(s):  
M. Żujewski ◽  
W. Nakwaski

AbstractThe paper describes an impact of various possible inaccuracies in manufacturing of verticalcavity surface-emitting diode lasers (VCSELs), like thicknesses and compositions of their layers different from assumed ones, on VCSEL room-temperature (RT) continuous-wave (CW) threshold performance. To this end, the fully self-consistent comprehensive optical-electrical-thermal-recombination VCSEL model has been applied. While the analysis has been carried out for the 1.3-μm oxide-confined intra-cavity contacted GaInNAs/GaAs VCSEL, its conclusions are believed to be more general and concern most of modern VCSEL designs. As expected, the VCSEL active region has been found to require the most scrupulous care in its fabrication, any uncontrolled variation in compositions and/or thicknesses of its layers is followed by unaccepted RT CW lasing threshold increase. Also spacer thicknesses should be manufactured with care to ensure a proper overlapping of the optical standing wave and both the gain and lossy areas within the cavity. On the contrary, less than 5% thickness changes in distributed-Bragg-reflectors are followed by nearly insignificant changes in VCSEL RT CW threshold. However, exceeding the above limit causes a rapid increase in lasing thresholds. As expected, in all the above cases, VCSELs equipped with larger active regions have been confirmed to require more careful technology. The above results should enable easier organization of VCSEL manufacturing.


2019 ◽  
Vol 7 (9) ◽  
pp. 1081 ◽  
Author(s):  
Yu Han ◽  
Wai Kit Ng ◽  
Ying Xue ◽  
Kam Sing Wong ◽  
Kei May Lau

2012 ◽  
Vol 20 (9) ◽  
pp. 9999 ◽  
Author(s):  
Jae Hyoung Ryu ◽  
Hee Yun Kim ◽  
Hyun Kyu Kim ◽  
Yashpal Singh Katharria ◽  
Nam Han ◽  
...  

2009 ◽  
Vol 2 (12) ◽  
pp. 121003 ◽  
Author(s):  
Mathieu Bellanger ◽  
Valérie Bousquet ◽  
Gabriel Christmann ◽  
Jeremy Baumberg ◽  
Matthias Kauer

2004 ◽  
Vol 831 ◽  
Author(s):  
M. B. Charles ◽  
M. J. Kappers ◽  
C. J. Humphreys

ABSTRACTThe strain in Al0.80Ga0.20N/GaN distributed Bragg reflectors (DBRs) grown by metalorganic vapour phase epitaxy (MOVPE) on Si(111) was studied using high resolution X-ray diffraction (XRD). Previous studies have shown that a 50nm Al0.80Ga0.20N layer induced a compressive strain in Al0.12Ga0.88N capping layers and prevented crack formation. A seven period Al0.80Ga0.20N/GaN DBR was grown, but this was found to be cracked at room temperature, despite compression in the GaN layers. This problem was solved by growing an identical structure with the addition of a 650nm GaN cap, and due to the compression in this layer, the structure was crack-free.


2007 ◽  
Vol 91 (21) ◽  
pp. 211108 ◽  
Author(s):  
Rajat Sharma ◽  
Yong-Seok Choi ◽  
Chiou-Fu Wang ◽  
Aurélien David ◽  
Claude Weisbuch ◽  
...  

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