Lanthanide Oxide Thin Films by Metalorganic Chemical Vapor Deposition Employing Volatile Guanidinate Precursors

Andrian P. Milanov; Teodor Toader; Harish Parala; Davide Barreca; Alberto Gasparotto; Claudia Bock; Hans-Werner Becker; Divine K. Ngwashi; Richard Cross; Shashi Paul; Ulrich Kunze; Roland A. Fischer; Anjana Devi

doi:10.1021/cm902123m

Lanthanide Oxide Thin Films by Metalorganic Chemical Vapor Deposition Employing Volatile Guanidinate Precursors

Chemistry of Materials ◽

10.1021/cm902123m ◽

2009 ◽

Vol 21 (22) ◽

pp. 5443-5455 ◽

Cited By ~ 32

Author(s):

Andrian P. Milanov ◽

Teodor Toader ◽

Harish Parala ◽

Davide Barreca ◽

Alberto Gasparotto ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Lanthanide Oxide ◽

Metalorganic Chemical

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Plasma Metalorganic Chemical Vapor Deposition of Indium Oxide Thin Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.28.l1096 ◽

1989 ◽

Vol 28 (Part 2, No. 7) ◽

pp. L1096-L1097 ◽

Cited By ~ 36

Author(s):

Toshiro Maruyama ◽

Toshio Kitamura

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Indium Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metalorganic Chemical

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Characterization of Hafnium Oxide Thin Films by Source Gas Pulse Introduced Metalorganic Chemical Vapor Deposition Using Amino-Family Hf Precursors

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.6015 ◽

2003 ◽

Vol 42 (Part 1, No. 9B) ◽

pp. 6015-6018 ◽

Cited By ~ 12

Author(s):

Shiro Hino ◽

Makoto Nakayama ◽

Kenji Takahashi ◽

Hiroshi Funakubo ◽

Eisuke Tokumitsu

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Hafnium Oxide ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metalorganic Chemical

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Microstructure and optical properties of scandium oxide thin films prepared by metalorganic chemical-vapor deposition

Applied Physics Letters ◽

10.1063/1.1424072 ◽

2001 ◽

Vol 79 (23) ◽

pp. 3782-3784 ◽

Cited By ~ 32

Author(s):

Z. Xu ◽

A. Daga ◽

Haydn Chen

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Scandium Oxide ◽

Oxide Thin Films ◽

Metalorganic Chemical

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Growth of metal oxide thin films by laser‐induced metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.363718 ◽

1996 ◽

Vol 80 (12) ◽

pp. 7073-7083 ◽

Cited By ~ 21

Author(s):

Koji Tokita ◽

Fumio Okada

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metal Oxide Thin Films ◽

Metalorganic Chemical

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Cobalt oxide thin films prepared by metalorganic chemical vapor deposition from cobalt acetylacetonate

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:2001381 ◽

2001 ◽

Vol 11 (PR3) ◽

pp. Pr3-637-Pr3-643 ◽

Cited By ~ 7

Author(s):

A. U. Mane ◽

K. Shalini ◽

S. A. Shivashankar

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Cobalt Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Cobalt Acetylacetonate ◽

Metalorganic Chemical

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Low temperature growth of oxide thin films by metalorganic chemical vapor deposition

Integrated Ferroelectrics ◽

10.1080/10584589808238765 ◽

1998 ◽

Vol 20 (1-4) ◽

pp. 55-64 ◽

Cited By ~ 1

Author(s):

S. S. Yom

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Temperature Growth ◽

Low Temperature Growth ◽

Metalorganic Chemical

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Photo-Assisted Metalorganic Chemical Vapor Deposition of Zinc Oxide Thin Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.28.l346 ◽

1989 ◽

Vol 28 (Part 2, No. 3) ◽

pp. L346-L348 ◽

Cited By ~ 8

Author(s):

Toshiro Maruyama ◽

Akinobu Nakai

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metalorganic Chemical

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Thermal Properties of Tri(o-tolyl)bismuth for Preparation of Oxide Thin Films by Metalorganic Chemical Vapor Deposition.

NIPPON KAGAKU KAISHI ◽

10.1246/nikkashi.1999.45 ◽

1999 ◽

pp. 45-49 ◽

Cited By ~ 1

Author(s):

Yuzo TASAKI ◽

Junichi ISHIAI ◽

Shuji YOSHIZAWA ◽

Yasuo KUNIYA

Keyword(s):

Thin Films ◽

Thermal Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Metalorganic Chemical

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Remote Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Aluminum Oxide Thin Films

Plasma Processes and Polymers ◽

10.1002/ppap.200700164 ◽

2008 ◽

Vol 5 (7) ◽

pp. 645-652 ◽

Cited By ~ 7

Author(s):

Ioana Volintiru ◽

Mariadriana Creatore ◽

Johannes L. van Hemmen ◽

Mauritius C. M. van de Sanden

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Oxide Thin Films ◽

Remote Plasma ◽

Metalorganic Chemical

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Effect of Substrates and Thermal Treatments on Metalorganic Chemical Vapor Deposition-Grown Sb2Te3 Thin Films

Crystal Growth & Design ◽

10.1021/acs.cgd.1c00508 ◽

2021 ◽

Author(s):

Martino Rimoldi ◽

Raimondo Cecchini ◽

Claudia Wiemer ◽

Emanuele Longo ◽

Stefano Cecchi ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Thermal Treatments ◽

Metalorganic Chemical

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