Surface chemistry of dimethylaluminum hydride and trimethylaluminum on polycrystalline aluminum

1991 ◽  
Vol 95 (3) ◽  
pp. 1329-1333 ◽  
Author(s):  
Daniel R. Strongin ◽  
Paul B. Comita
Keyword(s):  
Surface Chemistry ◽  
Polycrystalline Aluminum ◽  
Dimethylaluminum Hydride

Surface Chemistry of Dimethylaluminum Hydride and Trimethylaluminum on Aluminum

1989 ◽  
Vol 158 ◽  
Author(s):  
Daniel R. Strongin ◽  
Paul B. Comita
Keyword(s):  
Surface Chemistry ◽  
Auger Electron Spectroscopy ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Temperature Programmed Desorption ◽  
Aluminum Surface ◽  
Desorption Peak ◽  
Carbonaceous Species ◽  
Temperature Programmed ◽  
Dimethylaluminum Hydride

ABSTRACTThe surface chemistry of dimethylaluminum hydride (DMAH) and trimethylaluminum (TMA) on aluminum has been investigated with temperature programmed desorption (TPD), and Auger electron spectroscopy (AES). The TPD spectra of TMA shows a single desorption peak with a peak maximum which shifts from 190 to 200 K for surface coverages of 0.5 and 2.0 monolayers (ML) respectively. DMAH desorbs from an aluminum surface between 198 and 236 K at surface coverages ranging from 0.1 to 4.0 ML. A second DMAH desorption peak is observed at about 200 K (2.0 ML) when the aluminum surface is contaminated with carbonaceous species, resulting from the decomposition of DMAH. Both DMAH and TMA yield methane as a reaction product on the aluminum surface. The surface reactions of DMAH on aluminum also yield TMA as a reaction product.

Transmission Electron Microscopy Studies of Aluminum Oxidation

1985 ◽  
Vol 43 ◽  
pp. 268-269
Author(s):  
J.Y. Lee
Keyword(s):  
Nucleation And Growth ◽  
Ion Milling ◽  
Cross Sectional ◽  
Polycrystalline Aluminum ◽  
Axis Orientation ◽  
Temperature Oxidation ◽  
Aluminum Oxidation ◽  
Transmission Electron ◽  
High Resolution Images ◽  
Argon Ion

In the oxidation of metals and alloys, microstructural features at the atomic level play an important role in the nucleation and growth of the oxide, but little is known about the atomic mechanisms of high temperature oxidation. The present paper describes current progress on crystallographic aspects of aluminum oxidation. The 99.999% pure, polycrystalline aluminum was chemically polished and oxidized in 1 atm air at either 550°C or 600°C for times from 0.5 hr to 4 weeks. Cross-sectional specimens were prepared by forming a sandwich with epoxy, followed by mechanical polishing and then argon ion milling. High resolution images were recorded in a <110>oxide zone-axis orientation with a JE0L JEM 200CX microscope operated at 200 keV.

Surface chemistry: Water on the web

Nature China ◽  
2010 ◽  
Author(s):  
Felix Cheung
Keyword(s):  
Surface Chemistry ◽  
The Web

Surface chemistry: What's nice for ice?

Nature China ◽  
2012 ◽  
Author(s):  
Xiao Cheng
Keyword(s):  
Surface Chemistry

Photoluminescence behavior of silicon nanocrystals: Role of surface chemistry and size

2008 ◽  
Author(s):  
Anoop Gupta ◽  
Folarin Erogbogbo ◽  
Mark T. Swihart ◽  
Hartmut Wiggers
Keyword(s):  
Surface Chemistry ◽  
Silicon Nanocrystals ◽  
Photoluminescence Behavior

Improved Autoadhesion Measurement Method for Micromachined Polysilicon Beams

1996 ◽  
Vol 444 ◽  
Author(s):  
Maarten P. de Boer ◽  
Terry A. Michalske
Keyword(s):  
Surface Chemistry ◽  
Optical Microscopy ◽  
Measurement Method ◽  
Current Practice ◽  
Cantilever Beams ◽  
Beam Length ◽  
Substrate Adhesion

AbstractWe have measured autoadhesion (e.g. stiction) of individual polysilicon beams by interferometric optical microscopy. Untreated cantilever beams were dried from water in air, while treated beams were coated with a hydrophobic molecular coating of octadecyltrichlorosilane (ODTS). Adhesion values obtained for beams adhered to the substrate over a long length (large d) are independent of beam length with values of 16.7 and 4.4 mJ/m2 for untreated and treated samples respectively. These values can be understood in terms of differences in surface chemistry and polysilicon roughness. Using the shortest length beam which remains attached to the substrate, adhesion values were 280 and 16 mJ/m2 respectively. These higher values may be a result of capillarity effects. We recommend that measurements be made on beams in which d is large, in contrast to the current practice of noting the shortest beam adhered.

Surface Chemistry Effects on Quantum Confinement in Group IV Nanocrystals

2019 ◽  
Author(s):  
Nathan Neale ◽  
Michael Carroll ◽  
Rens Limpens ◽  
Lance Wheeler ◽  
Gregory Pach
Keyword(s):  
Surface Chemistry ◽  
Quantum Confinement ◽  
Group Iv
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